SCHEMBL29154516

SCHEMBL29154516

CPC(=O)c1ccc(-c2ccccc2)c(-c2ccccc2)c1-c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HNF4A P41235 1/20 0.40
▸ HDAC4 P56524 1/20 0.39
▸ HDAC2 Q92769 1/20 0.39
▸ HDAC8 Q9BY41 1/20 0.39
▸ HDAC6 Q9UBN7 1/20 0.39
▸ MEN1 O00255 3/20 0.39
▸ KMT2A Q03164 3/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.39
▸ BCAT2 O15382 1/20 0.38
▸ HDAC7 Q8WUI4 1/20 0.37
▸ FOLH1 Q04609 1/20 0.35
▸ ALDH1A1 P00352 3/20 0.34
▸ PTPN1 P18031 1/20 0.34
▸ CHRNB2 P17787 1/20 0.34
▸ CHRNB4 P30926 1/20 0.34
▸ CHRNA3 P32297 1/20 0.34
▸ CHRNA4 P43681 1/20 0.34
▸ PTGS1 P23219 2/20 0.33
▸ PTGS2 P35354 2/20 0.33
▸ HTT P42858 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27556088 0.80 MAPT (0.44) HNF4AHDAC4HDAC2HDAC8HDAC6
SCHEMBL12006684 0.80 HNF4A (0.55) HNF4AMEN1KMT2ABCAT2FOLH1
SCHEMBL10538142 0.77 HNF4A (0.47) HNF4AHDAC4HDAC2HDAC8HDAC6
SCHEMBL28526934 0.77 HNF4A (0.43) HNF4AHDAC4HDAC2HDAC8HDAC6
SCHEMBL28159776 0.77 BCAT2 (0.60) HNF4AMEN1KMT2ABCAT2ALDH1A1
SCHEMBL29186606 0.75 HNF4A (0.42) HNF4AHDAC4HDAC2HDAC8HDAC6
SCHEMBL27514569 0.75 ALDH1A1 (0.56) HNF4AMEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL28314588 0.74 HNF4A (0.41) HNF4AHDAC4HDAC2HDAC8HDAC6
SCHEMBL11486740 0.73 WDR5 (0.44) KMT2ABCAT2
SCHEMBL1707625 0.72 NPC1 (0.49) HNF4AHDAC4HDAC2HDAC8HDAC6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119291993-A Red photosensitive composition, film, color filter, solid-state imaging element, and image display device 爱天思株式会社 2025-01-10 — — CN disclosed
CN-110317174-B Hydrogen barrier agent, composition for forming hydrogen barrier film, method for producing hydrogen barrier film, and electronic device 东京应化工业株式会社 2024-10-22 — — CN disclosed
CN-117546089-A Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and pattern forming method 信越化学工业株式会社 2024-02-09 — — CN disclosed
CN-111406233-B Photosensitive resin composition, dry film resist and cured product thereof 日本化药株式会社 2023-12-26 — — CN disclosed
CN-111108099-B Compound, epoxy curing catalyst, and method for producing compound 东京应化工业株式会社 2023-09-29 — — CN disclosed
CN-116710846-A Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, and pattern forming method 信越化学工业株式会社 2023-09-05 — — CN disclosed
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