⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2470442 | 0.78 | HSD11B1 (0.41) | — | |
| SCHEMBL7707622 | 0.77 | — | — | |
| SCHEMBL4394628 | 0.74 | GRM4 (0.33) | — | |
| SCHEMBL17291846 | 0.74 | GRM4 (0.30) | — | |
| SCHEMBL27409700 | 0.74 | — | — | |
| SCHEMBL6822508 | 0.74 | — | — | |
| SCHEMBL4371622 | 0.72 | RARA (0.33) | — | |
| SCHEMBL10623983 | 0.72 | TDP1 (0.31) | — | |
| SCHEMBL23496930 | 0.70 | P2RX7 (0.38) | — | |
| SCHEMBL28078294 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119955091-A | Polymer, positive-type negative-type photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, surface protective film, and electronic component | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| CN-115044040-B | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern forming method | 信越化学工业株式会社 | 2024-07-02 | — | — | CN | disclosed |