Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 2/20 | 0.34 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.33 |
| ▸ | FABP7 | O15540 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | CCR6 | P51684 | 1/20 | 0.32 |
| ▸ | GPR55 | Q9Y2T6 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12768995 | 0.82 | — | — | |
| SCHEMBL10137653 | 0.82 | LMNA (0.30) | — | |
| SCHEMBL10137646 | 0.82 | HSD11B1 (0.40) | EPHX2HSD11B1 | |
| SCHEMBL685928 | 0.80 | SLC6A3 (0.31) | — | |
| SCHEMBL10150478 | 0.80 | PPM1B (0.44) | EPHX2HSD11B1ALDH1A1CYP1A2CYP3A4 | |
| SCHEMBL12357093 | 0.79 | HSD11B1 (0.34) | HSD11B1 | |
| SCHEMBL12769004 | 0.79 | HSD11B1 (0.40) | HSD11B1ALDH1A1CYP2C9L3MBTL1 | |
| SCHEMBL10169615 | 0.79 | SLC6A3 (0.30) | — | |
| SCHEMBL12016474 | 0.79 | HSD11B1 (0.30) | HSD11B1FABP7 | |
| SCHEMBL16213975 | 0.78 | ALDH1A1 (0.34) | EPHX2EPHX1HSD11B1ALDH1A1CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12038689-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |