SCHEMBL29323683

SCHEMBL29323683

C=C(F)C(=O)OCCS(=O)(=O)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 7/20 0.45
L3MBTL1 Q9Y468 1/20 0.42
HTT P42858 1/20 0.40
HDAC1 Q13547 2/20 0.40
HDAC8 Q9BY41 2/20 0.40
MAPT P10636 1/20 0.40
HDAC3 O15379 1/20 0.40
HDAC4 P56524 1/20 0.40
HDAC7 Q8WUI4 1/20 0.40
HDAC2 Q92769 1/20 0.40
HDAC10 Q969S8 1/20 0.40
HDAC11 Q96DB2 1/20 0.40
HDAC6 Q9UBN7 1/20 0.40
HDAC9 Q9UKV0 1/20 0.40
HDAC5 Q9UQL6 1/20 0.40
POLB P06746 1/20 0.40
ALDH1A1 P00352 1/20 0.39
PSIP1 O75475 1/20 0.39
LMNA P02545 1/20 0.39
MMP1 P03956 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1130280 0.84 MAPT (0.47) HSD11B1L3MBTL1HTTMAPTPOLB
SCHEMBL156165 0.81 HSD11B1 (0.55) HSD11B1L3MBTL1HTTHDAC1HDAC8
SCHEMBL111775 0.80 HSD11B1 (0.53) HSD11B1L3MBTL1HTTHDAC1HDAC8
SCHEMBL28023725 0.79 MAPT (0.50) HSD11B1L3MBTL1HTTHDAC1HDAC8
SCHEMBL7523793 0.78 HSD11B1 (0.51) HSD11B1L3MBTL1HTTHDAC1HDAC8
SCHEMBL9042721 0.78 HSD11B1 (0.45) HSD11B1L3MBTL1HDAC1HDAC8MAPT
SCHEMBL787249 0.77 LMNA (0.54) HSD11B1L3MBTL1HDAC1HDAC8MAPT
SCHEMBL12237322 0.77 CA2 (0.53) HSD11B1L3MBTL1HTTHDAC1HDAC8
SCHEMBL19657913 0.77 HSD11B1 (0.50) HSD11B1L3MBTL1HDAC1HDAC8MAPT
SCHEMBL6422781 0.77 HSD11B1 (0.50) HSD11B1L3MBTL1HDAC1HDAC8MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed