SCHEMBL29330642

SCHEMBL29330642

C=CCc1cc(C(C)(C)c2ccc(OCC(O)COCC3CCC(C(=O)OCC(O)CC)CC3)c(CC=C)c2)ccc1OC

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.41
SMN1; SMN2 Q16637 5/20 0.41
NPC1 O15118 2/20 0.41
TP53 P04637 2/20 0.41
RAB9A P51151 2/20 0.41
TSHR P16473 1/20 0.41
LMNA P02545 6/20 0.38
MAPT P10636 5/20 0.38
MEN1 O00255 4/20 0.38
KMT2A Q03164 4/20 0.38
HTT P42858 2/20 0.38
KDM4E B2RXH2 2/20 0.38
GAA P10253 1/20 0.38
PDE4B Q07343 2/20 0.36
TDP1 Q9NUW8 2/20 0.36
POLB P06746 1/20 0.36
L3MBTL1 Q9Y468 2/20 0.35
NPSR1 Q6W5P4 2/20 0.34
CYP1A2 P05177 1/20 0.33
USP2 O75604 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29330689 0.97 ALDH1A1 (0.39) ALDH1A1SMN1; SMN2NPC1TP53RAB9A
SCHEMBL29330649 0.94 ALDH1A1 (0.42) ALDH1A1SMN1; SMN2NPC1TP53RAB9A
SCHEMBL29330896 0.93 ALDH1A1 (0.46) ALDH1A1SMN1; SMN2NPC1TP53RAB9A
SCHEMBL29330680 0.86 LMNA (0.41) ALDH1A1SMN1; SMN2NPC1TP53RAB9A
SCHEMBL29330684 0.85 ALDH1A1 (0.40) ALDH1A1SMN1; SMN2NPC1TP53RAB9A
SCHEMBL29330676 0.82 ALDH1A1 (0.51) ALDH1A1SMN1; SMN2NPC1TP53RAB9A
SCHEMBL29330667 0.80 LMNA (0.43) ALDH1A1SMN1; SMN2NPC1TP53RAB9A
SCHEMBL29330660 0.80 LMNA (0.43) ALDH1A1SMN1; SMN2NPC1TP53RAB9A
SCHEMBL29330672 0.80 LMNA (0.43) ALDH1A1SMN1; SMN2NPC1TP53RAB9A
SCHEMBL29330688 0.79 ALDH1A1 (0.42) ALDH1A1SMN1; SMN2NPC1TP53RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12044969-B2 Resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed