SCHEMBL29330680

SCHEMBL29330680

C=CCc1cc(C(C)(C)c2ccc(OCC(O)COC(=O)C3CCCCC3C(=O)OCC(O)CC)c(CC=C)c2)ccc1OC

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 6/20 0.41
ALDH1A1 P00352 5/20 0.41
KMT2A Q03164 5/20 0.41
MAPT P10636 4/20 0.41
SMN1; SMN2 Q16637 4/20 0.41
MEN1 O00255 4/20 0.41
HTT P42858 2/20 0.41
KDM4E B2RXH2 2/20 0.41
GAA P10253 1/20 0.41
TSHR P16473 2/20 0.39
NPC1 O15118 2/20 0.39
TP53 P04637 2/20 0.39
RAB9A P51151 2/20 0.39
PKM P14618 1/20 0.39
TDP1 Q9NUW8 2/20 0.38
POLB P06746 1/20 0.38
L3MBTL1 Q9Y468 2/20 0.36
CYP1A2 P05177 1/20 0.36
MTOR P42345 1/20 0.35
CYP3A4 P08684 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29330649 0.91 ALDH1A1 (0.42) LMNAALDH1A1KMT2AMAPTSMN1; SMN2
SCHEMBL29330684 0.89 ALDH1A1 (0.40) LMNAALDH1A1KMT2AMAPTSMN1; SMN2
SCHEMBL29330642 0.86 ALDH1A1 (0.41) LMNAALDH1A1KMT2AMAPTSMN1; SMN2
SCHEMBL29330676 0.85 ALDH1A1 (0.51) LMNAALDH1A1KMT2AMAPTSMN1; SMN2
SCHEMBL29330896 0.84 ALDH1A1 (0.46) LMNAALDH1A1KMT2AMAPTSMN1; SMN2
SCHEMBL29330689 0.84 ALDH1A1 (0.39) LMNAALDH1A1KMT2AMAPTSMN1; SMN2
SCHEMBL29330660 0.83 LMNA (0.43) LMNAALDH1A1KMT2AMAPTSMN1; SMN2
SCHEMBL29330672 0.83 LMNA (0.43) LMNAALDH1A1KMT2AMAPTSMN1; SMN2
SCHEMBL29330667 0.83 LMNA (0.43) LMNAALDH1A1KMT2AMAPTSMN1; SMN2
SCHEMBL29330686 0.82 LMNA (0.39) LMNAALDH1A1KMT2AMAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12044969-B2 Resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed