SCHEMBL29330660

SCHEMBL29330660

C=CCc1cc(C(C)(C)c2ccc(OCC(O)COC(=O)CCCCCCCCCCC(=O)OCC(O)CC)c(CC=C)c2)ccc1OC

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.43
SMN1; SMN2 Q16637 3/20 0.43
ALDH1A1 P00352 3/20 0.43
MAPT P10636 3/20 0.43
KDM4E B2RXH2 2/20 0.43
HTT P42858 2/20 0.43
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
GAA P10253 1/20 0.43
NPC1 O15118 1/20 0.41
TP53 P04637 1/20 0.41
TSHR P16473 1/20 0.41
RAB9A P51151 1/20 0.41
CNR2 P34972 3/20 0.38
L3MBTL1 Q9Y468 3/20 0.38
MAPK1 P28482 1/20 0.38
PTPN1 P18031 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
PPARA Q07869 1/20 0.38
POLB P06746 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29330667 1.00 LMNA (0.43) LMNASMN1; SMN2ALDH1A1MAPTKDM4E
SCHEMBL29330672 1.00 LMNA (0.43) LMNASMN1; SMN2ALDH1A1MAPTKDM4E
SCHEMBL29330676 0.88 ALDH1A1 (0.51) LMNASMN1; SMN2ALDH1A1MAPTKDM4E
SCHEMBL29330649 0.85 ALDH1A1 (0.42) LMNASMN1; SMN2ALDH1A1MAPTKDM4E
SCHEMBL29330680 0.83 LMNA (0.41) LMNASMN1; SMN2ALDH1A1MAPTKDM4E
SCHEMBL29330684 0.83 ALDH1A1 (0.40) LMNASMN1; SMN2ALDH1A1MAPTKDM4E
SCHEMBL29330686 0.81 LMNA (0.39) LMNASMN1; SMN2ALDH1A1MAPTKDM4E
SCHEMBL29330642 0.80 ALDH1A1 (0.41) LMNASMN1; SMN2ALDH1A1MAPTKDM4E
SCHEMBL22222289 0.80 ALDH1A1 (0.44) LMNASMN1; SMN2ALDH1A1MAPTKDM4E
SCHEMBL29330896 0.79 ALDH1A1 (0.46) LMNASMN1; SMN2ALDH1A1MAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12044969-B2 Resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed