Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | GABRP | O00591 | 1/20 | 0.42 |
| ▸ | GABRD | O14764 | 1/20 | 0.42 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.42 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.42 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.42 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.42 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.42 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.42 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.42 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.42 |
| ▸ | GABRA4 | P48169 | 1/20 | 0.42 |
| ▸ | GABRE | P78334 | 1/20 | 0.42 |
| ▸ | GABRA6 | Q16445 | 1/20 | 0.42 |
| ▸ | GABRG1 | Q8N1C3 | 1/20 | 0.42 |
| ▸ | GABRG3 | Q99928 | 1/20 | 0.42 |
| ▸ | GABRQ | Q9UN88 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL487367 | 1.00 | ALDH1A1 (0.46) | ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP | |
| SCHEMBL7880346 | 0.93 | ALDH1A1 (0.41) | ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP | |
| SCHEMBL27262240 | 0.93 | LTA4H (0.48) | ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP | |
| SCHEMBL1127920 | 0.93 | ALDH1A1 (0.44) | ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP | |
| SCHEMBL23403866 | 0.91 | KDM4E (0.62) | ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP | |
| SCHEMBL23271639 | 0.89 | ALDH1A1 (0.41) | ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP | |
| SCHEMBL29363526 | 0.88 | LTA4H (0.52) | ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP | |
| SCHEMBL442080 | 0.88 | LTA4H (0.52) | ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP | |
| SCHEMBL29366529 | 0.88 | GABRP (0.40) | ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP | |
| SCHEMBL754309 | 0.88 | GABRP (0.40) | ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 149 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119912304-A | Synthesis method and application of visible light-promoted structure asymmetric sulfoxide | 湖南初源新材料股份有限公司 | 2025-05-02 | — | — | CN | claimed |
| CN-116547321-A | Photopolymerizable composition, optical member formed therefrom, and display device | 株式会社东进世美肯 | 2023-08-04 | — | — | CN | claimed |
| WO-2022114837-A1 | PHOTO-POLYMERIZABLE COMPOSITION, OPTICAL ELEMENT PREPARED THEREFROM, AND DISPLAY DEVICE | 주식회사 동진쎄미켐 | 2022-06-02 | — | — | WO | claimed |
| CN-115087929-B | Alkali-soluble resin, photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for forming wiring pattern | 株式会社力森诺科 | 2026-05-19 | — | — | CN | disclosed |
| CN-122062050-A | Bearing device, method for manufacturing bearing device, hard disk drive device, and motor | 美蓓亚三美株式会社 | 2026-05-19 | — | — | CN | disclosed |
| CN-120202439-A | Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board | 株式会社力森诺科 | 2025-06-24 | — | — | CN | disclosed |
| CN-120077329-A | Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern | 旭化成株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-120041103-A | Active energy ray-curable adhesive and laminate | 爱天思株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-120040723-A | Curable composition, cured film, organic EL element, and method for producing same | JSR株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-120019084-A | Photopolymerization initiator | 科巨希化学股份有限公司 | 2025-05-16 | — | — | CN | disclosed |
| CN-119937243-A | Chemically amplified positive photosensitive resin composition, cured film, and element having cured film | 奇美实业股份有限公司 | 2025-05-06 | — | — | CN | disclosed |
| CN-114426787-A | Active energy ray-curable composition | 阪田油墨股份有限公司 | 2022-05-03 | — | — | CN | disclosed |
| CN-109476943-B | Photocurable transparent ink composition for inkjet printing | 阪田油墨股份有限公司 | 2022-04-26 | — | — | CN | disclosed |
| CN-114402260-A | Photoacid generators | 三亚普罗股份有限公司 | 2022-04-26 | — | — | CN | disclosed |
| CN-114341732-A | Liquid hybrid uv/vis radiation curable resin compositions for additive manufacturing | 科思创(荷兰)有限公司 | 2022-04-12 | — | — | CN | disclosed |
| CN-110431198-B | Photocurable ink composition for inkjet printing | 阪田油墨股份有限公司 | 2022-04-12 | — | — | CN | disclosed |
| CN-108027558-B | Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication | 科思创(荷兰)有限公司 | 2022-03-25 | — | — | CN | disclosed |
| CN-106970503-B | Photosensitive composition | 东京应化工业株式会社 | 2022-02-01 | — | — | CN | disclosed |
| CN-111690308-B | Energy-curable composition and use thereof in the field of energy curing | 常州强力先端电子材料有限公司 | 2022-02-01 | — | — | CN | disclosed |
| CN-109503761-B | Stable matrix-filled liquid radiation curable resin compositions for additive fabrication | 科思创(荷兰)有限公司 | 2022-02-01 | — | — | CN | disclosed |