SCHEMBL487367

SCHEMBL487367

CCCOc1c2ccccc2c(OCCC)c2ccccc12

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.46
KDM4E B2RXH2 4/20 0.46
SMN1; SMN2 Q16637 3/20 0.46
MAPK1 P28482 1/20 0.46
GABRP O00591 1/20 0.42
GABRD O14764 1/20 0.42
GABRA1 P14867 1/20 0.42
GABRB1 P18505 1/20 0.42
GABRG2 P18507 1/20 0.42
GABRB3 P28472 1/20 0.42
GABRA5 P31644 1/20 0.42
GABRA3 P34903 1/20 0.42
GABRA2 P47869 1/20 0.42
GABRB2 P47870 1/20 0.42
GABRA4 P48169 1/20 0.42
GABRE P78334 1/20 0.42
GABRA6 Q16445 1/20 0.42
GABRG1 Q8N1C3 1/20 0.42
GABRG3 Q99928 1/20 0.42
GABRQ Q9UN88 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29363872 1.00 ALDH1A1 (0.46) ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP
SCHEMBL7880346 0.93 ALDH1A1 (0.41) ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP
SCHEMBL27262240 0.93 LTA4H (0.48) ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP
SCHEMBL1127920 0.93 ALDH1A1 (0.44) ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP
SCHEMBL23403866 0.91 KDM4E (0.62) ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP
SCHEMBL23271639 0.89 ALDH1A1 (0.41) ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP
SCHEMBL29363526 0.88 LTA4H (0.52) ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP
SCHEMBL442080 0.88 LTA4H (0.52) ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP
SCHEMBL29366529 0.88 GABRP (0.40) ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP
SCHEMBL754309 0.88 GABRP (0.40) ALDH1A1KDM4ESMN1; SMN2MAPK1GABRP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1213 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250171566-A1 LIQUID, HYBRID UV/VIS RADIATION CURABLE RESIN COMPOSITIONS FOR ADDITIVE FABRICATION STRATASYS INC (US) 2025-05-29 US claimed
WO-2024142486-A1 PHOTOSENSITIVE ELEMENT AND METHOD FOR PRODUCING CIRCUIT BOARD 株式会社レゾナック 2024-07-04 WO claimed
US-20230295357-A1 PHOTOPOLYMERIZABLE COMPOSITION, OPTICAL ELEMENT PREPARED THEREFROM, AND DISPLAY DEVICE DONGJIN SEMICHEM CO., LTD. (KR) 2023-09-21 US claimed
CN-116547321-A Photopolymerizable composition, optical member formed therefrom, and display device 株式会社东进世美肯 2023-08-04 CN claimed
US-11635688-B2 Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates KAYAKU ADVANCED MATERIALS, INC. (US) 2023-04-25 US claimed
CN-108541270-A The low degassing composition of high-temperature stable, includes the use of the protection band of the composition and such belt and thin glass 康宁股份有限公司 2018-09-14 CN claimed
US-20180044560-A1 HIGH TEMPERATURE STABLE, LOW OUTGASSING COMPOSITION, PROTECTIVE TAPE COMPRISING SUCH COMPOSITION AND USE OF SUCH TAPE WITH THIN GLASS CORNING INC (US) 2018-02-15 US claimed
EP-3265530-A1 HIGH TEMPERATURE STABLE, LOW OUTGASSING COMPOSITION, PROTECTIVE TAPE COMPRISING SUCH COMPOSITION AND USE OF SUCH TAPE WITH THIN GLASS Corning Incorporated (US) 2018-01-10 EP claimed
US-20150024326-A1 PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES KAYAKU ADVANCED MATERIALS, INC. 2015-01-22 US claimed
WO-2013134104-A2 PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES MICROCHEM CORP. (US) 2013-09-12 WO claimed
US-7592376-B2 Photopolymerizable epoxide and oxetane compositions RENSSELAER POLYTECHNIC INSTITUTE (US) 2009-09-22 US claimed
US-20070232714-A1 Device having low outgassing photo or electron beam curable rubbery polymer material CORNING INCORPORATED 2007-10-04 US claimed
US-7256221-B2 Low outgassing photo or electron beam curable rubbery polymer material, preparation thereof and device comprising same CORNING INCORPORATED (US) 2007-08-14 US claimed
US-7232595-B2 Device comprising low outgassing photo or electron beam cured rubbery polymer material CORNING INCORPORATED (US) 2007-06-19 US claimed
US-20060041032-A1 Photopolymerizable epoxide and oxetane compositions CRIVELLO JAMES V 2006-02-23 US claimed
US-20050152595-A1 Device comprising low outgassing photo or electron beam cured rubbery polymer material CORNING INCORPORATED 2005-07-14 US claimed
US-20050064333-A1 Thianthrenium salt cationic photoinitiators RENSSELAER POLYTECHNIC INSTITUTE (US) 2005-03-24 US claimed
EP-1504306-A1 PHOTOPOLYMERIZABLE COMPOSITIONS COMPRISING THIANTHRENIUM SALTS AS CATIONIC PHOTOINITIATORS RENSSELAER POLYTECHNIC INSTITUTE (US) 2005-02-09 EP claimed
US-20040092618-A1 Low outgassing photo or electron beam curable rubbery polymer material, preparation thereof and device comprising same CORNING INCORPORATED 2004-05-13 US claimed
WO-2003098347-A1 PHOTOPOLYMERIZABLE COMPOSITIONS COMPRISING THIANTHRENIUM SALT CATIONIC PHOTOINITIATORS RENSSELAER POLYTECHNIC INSTITUTE (US) 2003-11-27 WO claimed