SCHEMBL29367478

SCHEMBL29367478

CCOc1c2ccccc2c(OCC)c2cc(C(C)(C)C)ccc12

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 3/20 0.46
PGR P06401 1/20 0.41
RORA P35398 1/20 0.41
RORC P51449 1/20 0.41
RORB Q92753 1/20 0.41
PPARG P37231 1/20 0.39
ALDH1A1 P00352 7/20 0.37
RAB9A P51151 2/20 0.37
NPC1 O15118 1/20 0.37
PLA2G1B P04054 1/20 0.37
NFKB1 P19838 1/20 0.37
CASP3 P42574 1/20 0.37
NFKB2 Q00653 1/20 0.37
RELA Q04206 1/20 0.37
SENP8 Q96LD8 1/20 0.37
SENP7 Q9BQF6 1/20 0.37
SENP6 Q9GZR1 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
ATG4B Q9Y4P1 1/20 0.37
EPHX2 P34913 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL755711 1.00 KIF11 (0.46) KIF11PGRRORARORCRORB
SCHEMBL753576 0.88 KIF11 (0.42) KIF11PGRRORARORCRORB
SCHEMBL29366244 0.88 KIF11 (0.42) KIF11PGRRORARORCRORB
SCHEMBL1470700 0.87 PGR (0.47) KIF11PGRRORARORCRORB
SCHEMBL29690008 0.87 PGR (0.47) KIF11PGRRORARORCRORB
SCHEMBL23403863 0.86 ALDH1A1 (0.40) KIF11PGRRORARORCRORB
SCHEMBL10016181 0.85 PGR (0.46) KIF11PGRRORARORCRORB
SCHEMBL10016173 0.84 PGR (0.45) KIF11PGRRORARORCRORB
SCHEMBL10016165 0.84 PGR (0.45) KIF11PGRRORARORCRORB
SCHEMBL10046163 0.84 PGR (0.45) KIF11PGRRORARORCRORB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119937243-A Chemically amplified positive photosensitive resin composition, cured film, and element having cured film 奇美实业股份有限公司 2025-05-06 CN disclosed
WO-2024006799-A1 COVALENT ATTACHMENT OF SPLINT OLIGONUCLEOTIDES FOR MOLECULAR ARRAY GENERATION USING LIGATION 10X GENOMICS, INC. (US) 2024-01-04 WO disclosed
EP-4271511-A1 MOLECULAR ARRAY GENERATION USING PHOTORESIST 10X Genomics, Inc. (US) 2023-11-08 EP disclosed
CN-116360211-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2023-06-30 CN disclosed
CN-109799680-B Chemically amplified positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2023-03-10 CN disclosed
CN-113264856-B Sulfonium salt, photoacid generator, and photosensitive composition 东京应化工业株式会社 2022-11-22 CN disclosed
CN-108241257-B Chemically amplified positive photosensitive resin composition, method for producing substrate with mold, and method for producing molded article by plating 奇美实业股份有限公司 2022-11-08 CN disclosed
WO-2022147140-A1 MOLECULAR ARRAY GENERATION USING PHOTORESIST 10X GENOMICS, INC. (US) 2022-07-07 WO disclosed
CN-111690308-B Energy-curable composition and use thereof in the field of energy curing 常州强力先端电子材料有限公司 2022-02-01 CN disclosed