SCHEMBL29370295

SCHEMBL29370295

CC(C)(c1ccc(O)c(O)c1O)c1ccc(O)c(O)c1O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.39
ALOX15 P16050 5/20 0.39
HSD17B10 Q99714 4/20 0.39
LMNA P02545 2/20 0.39
ESR1 P03372 2/20 0.39
NR1I2 O75469 1/20 0.39
CYP2C9 P11712 1/20 0.39
MIF P14174 1/20 0.39
TYR P14679 1/20 0.39
HTT P42858 1/20 0.39
NFE2L2 Q16236 1/20 0.39
CA2 P00918 3/20 0.39
TDP1 Q9NUW8 3/20 0.37
TSHR P16473 2/20 0.37
ALOX12 P18054 1/20 0.36
KDM4E B2RXH2 1/20 0.36
CYP1A2 P05177 1/20 0.36
MAPT P10636 1/20 0.36
ATP2A2 P16615 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL36382 1.00 ALDH1A1 (0.39) ALDH1A1ALOX15HSD17B10LMNAESR1
SCHEMBL6751257 0.88 ESR1 (0.46) ALDH1A1ALOX15HSD17B10LMNAESR1
SCHEMBL9752056 0.87 ALDH1A1 (0.54) ALDH1A1ALOX15HSD17B10LMNAESR1
SCHEMBL8977700 0.87 ALDH1A1 (0.43) ALDH1A1ALOX15HSD17B10LMNAESR1
SCHEMBL8644897 0.85 ALDH1A1 (0.48) ALDH1A1ALOX15HSD17B10LMNAESR1
SCHEMBL8977698 0.85 ALDH1A1 (0.48) ALDH1A1ALOX15HSD17B10LMNAESR1
SCHEMBL29488108 0.84 CA2 (0.56) ALDH1A1ALOX15HSD17B10LMNANR1I2
SCHEMBL3169896 0.84 CA2 (0.56) ALDH1A1ALOX15HSD17B10LMNANR1I2
SCHEMBL29375143 0.83 ESR1 (0.58) ALDH1A1ALOX15HSD17B10LMNAESR1
SCHEMBL759290 0.83 ESR1 (0.58) ALDH1A1ALOX15HSD17B10LMNAESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122043858-A EUV patterned resist formation method 亚历克斯·P·G·罗宾逊 2026-05-15 CN disclosed
EP-4737506-A1 CURED FILM AND ORGANIC EL DISPLAY DEVICE Toray Industries, Inc. (JP) 2026-05-06 EP disclosed
EP-4702010-A1 PHOTOACTIVE COMPOUNDS Merck Patent GmbH (DE) 2026-03-04 EP disclosed
CN-120077104-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device 富士胶片株式会社 2025-05-30 CN disclosed
US-20250172873-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFACTURING CURED ARTICLE, ORGANIC EL DISPLAY DEVICE, AND DISPLAY DEVICE TORAY INDUSTRIES, INC. (JP) 2025-05-29 US disclosed
CN-119998728-A Film manufacturing method, photosensitive resin composition, cured product manufacturing method, cured product, and laminate 富士胶片株式会社 2025-05-13 CN disclosed
CN-119968421-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device 富士胶片株式会社 2025-05-09 CN disclosed
CN-119731595-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device 富士胶片株式会社 2025-03-28 CN disclosed
CN-119731225-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device 富士胶片株式会社 2025-03-28 CN disclosed
CN-119620544-A Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article 东京应化工业株式会社 2025-03-14 CN disclosed
CN-107561863-B Positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2022-09-16 CN disclosed
CN-114902135-A Positive photosensitive resin composition, cured film and resist film DIC株式会社 2022-08-12 CN disclosed
CN-107870516-B Positive photosensitive resin composition, patterned film and method for manufacturing bump 奇美实业股份有限公司 2022-08-02 CN disclosed
CN-114326300-A Positive photoresist composition, preparation method and photoresist pattern forming method 上海飞凯材料科技股份有限公司 2022-04-12 CN disclosed
WO-2022065041-A1 RESIN CONTAINING PHENOLIC HYDROXYL GROUP, RESIN COMPOSITION FOR ALKALI-DEVELOPABLE RESISTS, RESIST CURABLE RESIN COMPOSITION, AND METHOD FOR PRODUCING RESIN CONTAINING PHENOLIC HYDROXYL GROUP DIC株式会社 2022-03-31 WO disclosed
WO-2022059448-A1 METHOD FOR PRODUCING RESIST PATTERN, RESIST PATTERN AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR PRODUCTION OF TRANSPARENT MULTILAYER MEMBER DIC株式会社 2022-03-24 WO disclosed
CN-114207038-A Resin composition, method for producing cured product, patterned cured product, interlayer insulating film, covercoat, surface protective film, and electronic component 艾曲迪微系统股份有限公司 2022-03-18 CN disclosed
CN-107703685-B Laminate and method for producing laminate 东京应化工业株式会社 2022-03-18 CN disclosed
CN-107179652-B Positive photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2022-02-08 CN disclosed
CN-113994256-A Method for forming EUV patterned resist 亚历克斯·P·G·罗宾逊 2022-01-28 CN disclosed