Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 10/20 | 0.58 |
| ▸ | ESR2 | Q92731 | 7/20 | 0.58 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.58 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.58 |
| ▸ | HPGD | P15428 | 2/20 | 0.58 |
| ▸ | AR | P10275 | 1/20 | 0.58 |
| ▸ | TSHR | P16473 | 1/20 | 0.58 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.58 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.58 |
| ▸ | HTR6 | P50406 | 1/20 | 0.58 |
| ▸ | ESRRG | P62508 | 1/20 | 0.58 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | TYR | P14679 | 2/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.41 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | MIF | P14174 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29375143 | 1.00 | ESR1 (0.58) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL6751257 | 0.94 | ESR1 (0.46) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL9846448 | 0.87 | ESR1 (0.57) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL13589380 | 0.85 | ESR1 (0.54) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL4055015 | 0.85 | ESR1 (0.54) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL29370295 | 0.83 | ALDH1A1 (0.39) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL36382 | 0.83 | ALDH1A1 (0.39) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL28649969 | 0.79 | ESR1 (0.62) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL6157236 | 0.79 | ESR1 (0.62) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL759916 | 0.78 | ESR1 (0.48) | ESR1ESR2HSD17B10CYP3A4HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113620786-A | Method for synthesizing polyhydroxy phenolic compound by acid method | 辽宁靖帆新材料有限公司 | 2021-11-09 | — | — | CN | claimed |
| CN-113443969-A | Method for preparing 4- [1- (4-hydroxyphenyl) -1-methyl-ethyl ] pyrogallol by resin method | 辽宁靖帆新材料有限公司 | 2021-09-28 | — | — | CN | claimed |
| EP-0587942-A1 | Heat-resistant and flame-retardant or flameproof PUR hot melt adhesive | H.B. FULLER LICENSING & FINANCING, INC. (US) | 1994-03-23 | — | — | EP | claimed |
| WO-2025105140-A1 | COMPOUND, POLYMER, RESIST COMPOSITION, RESIST FILM, AND OPTICAL ELEMENT | ＡＧＣ株式会社 | 2025-05-22 | — | — | WO | disclosed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| WO-2025013535-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PARTITION WALL, AND OPTICAL ELEMENT | ＡＧＣ株式会社 | 2025-01-16 | — | — | WO | disclosed |
| EP-3224326-B1 | COATING COMPOSITION COMPRISING A BINDER FORMED FROM POLYESTER AND A PHOSPHORUS ACID | PPG IND OHIO INC (US) | 2024-10-16 | — | — | EP | disclosed |
| WO-2024135575-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PARTITION WALL, AND OPTICAL ELEMENT | ＡＧＣ株式会社 | 2024-06-27 | — | — | WO | disclosed |
| WO-2024038814-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PARTITION WALL, AND OPTICAL ELEMENT | ＡＧＣ株式会社 | 2024-02-22 | — | — | WO | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| US-11739215-B2 | Photosensitive resin composition | ZEON CORPORATION (JP) | 2023-08-29 | — | — | US | disclosed |
| WO-2005007719-A2 | POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-01-27 | — | — | WO | disclosed |
| CN-1550898-A | Positive anticorrosive additive composition and anticorrosive pattern forming method | 东京应化工业株式会社 | 2004-12-01 | — | — | CN | disclosed |
| US-20040081909-A1 | Novolak resin solution, positive photoresist composition and preparation method thereof | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-04-29 | — | — | US | disclosed |
| CN-1484095-A | Positive photoresist composition and method for forming slushing pattern | 东京应化工业株式会社 | 2004-03-24 | — | — | CN | disclosed |
| CN-1469197-A | Positive photoresist composition and method for forming resist pattern | 东京应化工业株式会社 | 2004-01-21 | — | — | CN | disclosed |
| CN-1469199-A | Positive photoresist composition and method for forming etch resistant pattern | 东京应化工业株式会社 | 2004-01-21 | — | — | CN | disclosed |
| CN-1453639-A | Novolac resin solution photoresist composition and its preparing method | TOKYO IND CO LTD (JP) | 2003-11-05 | — | — | CN | disclosed |
| EP-0587942-A1 | Heat-resistant and flame-retardant or flameproof PUR hot melt adhesive | H.B. FULLER LICENSING & FINANCING, INC. (US) | 1994-03-23 | — | — | EP | disclosed |
| EP-0587942-A1 | Heat-resistant and flame-retardant or flameproof PUR hot melt adhesive | H.B. FULLER LICENSING & FINANCING, INC. (US) | 1994-03-23 | — | — | EP | disclosed |