Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 5/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | ESR1 | P03372 | 2/20 | 0.39 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | MIF | P14174 | 1/20 | 0.39 |
| ▸ | TYR | P14679 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 3/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | ATP2A2 | P16615 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29370295 | 1.00 | ALDH1A1 (0.39) | ALDH1A1ALOX15HSD17B10LMNAESR1 | |
| SCHEMBL6751257 | 0.88 | ESR1 (0.46) | ALDH1A1ALOX15HSD17B10LMNAESR1 | |
| SCHEMBL9752056 | 0.87 | ALDH1A1 (0.54) | ALDH1A1ALOX15HSD17B10LMNAESR1 | |
| SCHEMBL8977700 | 0.87 | ALDH1A1 (0.43) | ALDH1A1ALOX15HSD17B10LMNAESR1 | |
| SCHEMBL8644897 | 0.85 | ALDH1A1 (0.48) | ALDH1A1ALOX15HSD17B10LMNAESR1 | |
| SCHEMBL8977698 | 0.85 | ALDH1A1 (0.48) | ALDH1A1ALOX15HSD17B10LMNAESR1 | |
| SCHEMBL29488108 | 0.84 | CA2 (0.56) | ALDH1A1ALOX15HSD17B10LMNANR1I2 | |
| SCHEMBL3169896 | 0.84 | CA2 (0.56) | ALDH1A1ALOX15HSD17B10LMNANR1I2 | |
| SCHEMBL29375143 | 0.83 | ESR1 (0.58) | ALDH1A1ALOX15HSD17B10LMNAESR1 | |
| SCHEMBL759290 | 0.83 | ESR1 (0.58) | ALDH1A1ALOX15HSD17B10LMNAESR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 729 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101355056-B | Method for manufacturing thin film transistor substrate and photosensitive composition used in the substrate | SAMSUNG DISPLAY CO LTD | 2014-02-26 | — | — | CN | claimed |
| US-8278021-B2 | Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-10-02 | — | — | US | claimed |
| US-20090030103-A1 | METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-29 | — | — | US | claimed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | claimed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | claimed |
| US-5434031-A | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-07-18 | — | — | US | claimed |
| US-5407780-A | High sensitivity, resolution and heat resistance | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-04-18 | — | — | US | claimed |
| US-5403696-A | Mixture of phenolic resin obtained by condensation reaction of formaldehyde with phenol mixture of meta-cresol and 2-tert-butyl-4-methylphenol or 2-tert-butyl-6-methylphenol and 1,2-quinone diazide compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-04-04 | — | — | US | claimed |
| US-5401617-A | Improved adhesion | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-03-28 | — | — | US | claimed |
| US-5288587-A | Novolaks; improved resolution and heat resistance | SUMITOMO CHEMICAL CO., LTD. (JP) | 1994-02-22 | — | — | US | claimed |
| EP-4131622-B1 | SEPARATOR FOR LITHIUM SECONDARY BATTERY, METHOD FOR MANUFACTURING SAME, AND LITHIUM SECONDARY BATTERY COMPRISING SAME | LG ENERGY SOLUTION LTD (KR) | 2026-01-28 | — | — | EP | disclosed |
| US-12424705-B2 | Separator for lithium secondary battery, method for manufacturing same, and lithium secondary battery comprising same | LG ENERGY SOLUTION, LTD. (KR) | 2025-09-23 | — | — | US | disclosed |
| US-12424707-B2 | Separator for lithium secondary battery, manufacturing method therefor, and lithium secondary battery comprising same | LG ENERGY SOLUTION, LTD. (KR) | 2025-09-23 | — | — | US | disclosed |
| WO-2025079919-A1 | PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, INSULATING FILM, AND SEMICONDUCTOR DEVICE | 주식회사 엘지화학 | 2025-04-17 | — | — | WO | disclosed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| EP-0422667-A1 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-04-17 | — | — | EP | disclosed |
| EP-0416544-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-03-13 | — | — | EP | disclosed |
| EP-0415266-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-03-06 | — | — | EP | disclosed |
| WO-1990005325-A1 | POSITIVE-WORKING PHOTORESISTS EMPLOYING A SELECTED MIXTURE OF ETHYL LACTATE AND ETHYL 3-ETHOXY PROPIONATE AS CASTING SOLVENT | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-05-17 | — | — | WO | disclosed |
| EP-0358871-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-03-21 | — | — | EP | disclosed |