Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 2/20 | 0.53 |
| ▸ | LPAR1 | Q92633 | 2/20 | 0.51 |
| ▸ | LPAR2 | Q9HBW0 | 2/20 | 0.51 |
| ▸ | LPAR3 | Q9UBY5 | 2/20 | 0.51 |
| ▸ | PPARA | Q07869 | 2/20 | 0.51 |
| ▸ | FAAH | O00519 | 2/20 | 0.50 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL29429675 | 1.00 | EPHX2 (0.53) | EPHX2LPAR1LPAR2LPAR3PPARA | |
| Sulfuric Acid SCHEMBL1007458 | 1.00 | EPHX2 (0.53) | EPHX2LPAR1LPAR2LPAR3PPARA | |
| Sulfuric Acid SCHEMBL1007455 | 1.00 | EPHX2 (0.53) | EPHX2LPAR1LPAR2LPAR3PPARA | |
| Sulfuric Acid SCHEMBL28413966 | 0.98 | EPHX2 (0.51) | EPHX2LPAR1LPAR2LPAR3PPARA | |
| Sulfuric Acid SCHEMBL29975070 | 0.98 | EPHX2 (0.51) | EPHX2LPAR1LPAR2LPAR3PPARA | |
| Sulfuric Acid SCHEMBL27928359 | 0.96 | EPHX2 (0.50) | EPHX2LPAR1LPAR2LPAR3PPARA | |
| Sulfuric Acid SCHEMBL873352 | 0.96 | EPHX2 (0.50) | EPHX2LPAR1LPAR2LPAR3PPARA | |
| Sulfuric Acid SCHEMBL17956295 | 0.95 | DUSP3 (0.53) | FAAH | |
| Sulfuric Acid SCHEMBL27885424 | 0.95 | EPHX2 (0.49) | EPHX2LPAR1LPAR2LPAR3PPARA | |
| SCHEMBL4427946 | 0.94 | EPHX2 (0.51) | EPHX2LPAR1LPAR2LPAR3PPARA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260146180-A1 | CERIA BASED COMPOSITIONS AND METHODS FOR HARD CARBON POLISHING | ENTEGRIS, INC. (US) | 2026-05-28 | — | — | US | disclosed |
| EP-4485584-B1 | ELECTRODE BINDER FOR BIOFUEL CELL | RESONAC CORP (JP) | 2026-05-13 | — | — | EP | disclosed |
| US-20260117080-A1 | METAL OXIDE PARTICLES HAVING CORE/SHELL STRUCTURE HAVING UNIFORM PARTICLE SIZE DISTRIBUTION, AND METHOD FOR PRODUCING SAME | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12606711-B2 | Conductive stannic oxide particle-containing organic solvent-dispersed sol and method of production thereof | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-21 | — | — | US | disclosed |
| US-20250388478-A1 | SILICA SOL CONTAINING ADDITIVE, AND METHOD FOR PRODUCING SAME | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-25 | — | — | US | disclosed |
| US-12466979-B2 | CMP composition including anionic and cationic inhibitors | CMC MATERIALS LLC (US) | 2025-11-11 | — | — | US | disclosed |
| US-20250313029-A1 | PHOTOSENSITIVE RESIN COMPOSITION, FLEXOGRAPHIC PRINTING RAW PLATE, AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-10-09 | — | — | US | disclosed |
| US-12428580-B2 | CMP composition including an anionic abrasive | CMC MATERIALS LLC (US) | 2025-09-30 | — | — | US | disclosed |
| US-20250256980-A1 | METAL OXIDE PARTICLE HAVING CORE-SHELL STRUCTURE AND METHOD FOR PRODUCING SAME | NISSAN CHEMICAL CORPORATION (JP) | 2025-08-14 | — | — | US | disclosed |
| US-12359039-B2 | Metal oxide particle-containing composition with reduced occurrence of volatile aldehydes | NISSAN CHEMICAL CORPORATION (JP) | 2025-07-15 | — | — | US | disclosed |
| CN-115807338-A | Antiviral raw material | 日本爱克兰工业株式会社 | 2023-03-17 | — | — | CN | disclosed |
| US-20230070776-A1 | CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE | CMC MATERIALS LLC | 2023-03-09 | — | — | US | disclosed |
| WO-2023028197-A1 | CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE | CMC MATERIALS, INC. (US) | 2023-03-02 | — | — | WO | disclosed |
| WO-2022239452-A1 | HEAT-RAY REDUCING MEMBRANE EQUIPPED WITH ANTI-FOGGING FUNCTION, HEAT-RAY REDUCING PAINT EQUIPPED WITH ANTI-FOGGING FUNCTION, AND HEAT-RAY REDUCING FILM EQUIPPED WITH ANTI-FOGGING FUNCTION | 三菱マテリアル電子化成株式会社 | 2022-11-17 | — | — | WO | disclosed |
| US-11493844-B2 | Photosensitive resin composition for flexographic printing plate, flexographic printing original plate, flexographic printing plate, and copolymer | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2022-11-08 | — | — | US | disclosed |
| WO-2022181298-A1 | WATER-BASED ANTIFOULING PAINT COMPOSITION, ANTIFOULING COATING FORMED USING SAME, AND FISHING NET, SHIP, AND UNDERWATER STRUCTURE HAVING COATING ON SURFACE | バッセル化学株式会社 | 2022-09-01 | — | — | WO | disclosed |
| US-20220220362-A1 | CHEMICAL FLUID CONTAINING AN ANTIOXIDANT FOR UNDERGROUND TREATMENT OF OIL AND GAS RESERVOIRS | NISSAN CHEMICAL CORPORATION (JP) | 2022-07-14 | — | — | US | disclosed |
| WO-2022150762-A2 | CHEMICAL FLUID CONTAINING AN ANTIOXIDANT FOR UNDERGROUND TREATMENT OF OIL AND GAS RESERVOIRS | NISSAN CHEMICAL CORPORATION (JP) | 2022-07-14 | — | — | WO | disclosed |
| WO-2022026355-A1 | CMP COMPOSITION INCLUDING ANIONIC AND CATIONIC INHIBITORS | CMC MATERIALS, INC. (US) | 2022-02-03 | — | — | WO | disclosed |
| US-20220033682-A1 | CMP COMPOSITION INCLUDING ANIONIC AND CATIONIC INHIBITORS | CMC MATERIALS LLC | 2022-02-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250388478-A1 | SILICA SOL CONTAINING ADDITIVE, AND METHOD FOR PRODUCING SAME | BLM, MIA3, MGAM2 | EPHX2 4637/4885LPAR1 4133/4885LPAR2 4293/4885 |
| US-20260117080-A1 | METAL OXIDE PARTICLES HAVING CORE/SHELL STRUCTURE HAVING UNIFORM PARTICLE SIZE DISTRIBUTION, AND METHOD FOR PRODUCING SAME | CD63, SLC39A3, ZRANB2 | EPHX2 4620/4885LPAR1 4344/4885LPAR2 4337/4885 |
| US-12606711-B2 | Conductive stannic oxide particle-containing organic solvent-dispersed sol and method of production thereof | SCO2, SOD1, SPOP | EPHX2 3969/4885LPAR1 2267/4885LPAR2 2448/4885 |
| US-20260146180-A1 | CERIA BASED COMPOSITIONS AND METHODS FOR HARD CARBON POLISHING | PLOD1, H1-4, H1-5 | EPHX2 216/4885LPAR1 273/4885LPAR2 250/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.