SCHEMBL29371948

SCHEMBL29371948

O=C(Oc1c2ccccc2c(OC(=O)c2ccccc2)c2cc(F)ccc12)c1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 6/20 0.48
▸ LMNA P02545 4/20 0.48
▸ GAA P10253 3/20 0.48
▸ POLB P06746 1/20 0.48
▸ KMT2A Q03164 8/20 0.46
▸ MEN1 O00255 3/20 0.46
▸ SMN1; SMN2 Q16637 2/20 0.46
▸ NPSR1 Q6W5P4 2/20 0.46
▸ HSD17B10 Q99714 2/20 0.46
▸ ESR1 P03372 2/20 0.46
▸ ESR2 Q92731 2/20 0.46
▸ JAK2 O60674 1/20 0.46
▸ USP2 O75604 1/20 0.46
▸ ALOX15 P16050 1/20 0.46
▸ PKM P14618 3/20 0.43
▸ ALDH1A1 P00352 2/20 0.43
▸ HTT P42858 1/20 0.43
▸ TDP1 Q9NUW8 1/20 0.42
▸ SLC2A1 P11166 1/20 0.42
▸ SLC2A4 P14672 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29371429 0.88 ALDH1A1 (0.49) MAPTLMNAGAAPOLBKMT2A
SCHEMBL29372731 0.84 LMNA (0.56) MAPTLMNAGAAPOLBKMT2A
SCHEMBL29371490 0.84 MAPT (0.44) MAPTLMNAPOLBKMT2AMEN1
SCHEMBL29372079 0.81 ABCB11 (0.49) MAPTLMNAGAAPOLBKMT2A
SCHEMBL29370930 0.81 GAA (0.51) MAPTLMNAGAAPOLBKMT2A
SCHEMBL29371669 0.81 MAPT (0.50) MAPTLMNAGAAPOLBKMT2A
SCHEMBL29371684 0.80 KDM4E (0.53) MAPTGAAPOLBKMT2AMEN1
SCHEMBL29368549 0.78 MAPT (0.52) MAPTLMNAGAAPOLBKMT2A
SCHEMBL29371436 0.76 ELANE (0.40) MAPTGAAKMT2AMEN1HSD17B10
SCHEMBL29372421 0.76 ELANE (0.40) MAPTKMT2ASMN1; SMN2ESR1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 — — CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 — — CN disclosed
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