Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2A6 | P11509 | 7/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 5/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.41 |
| ▸ | CA1 | P00915 | 2/20 | 0.41 |
| ▸ | CA2 | P00918 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | CA7 | P43166 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | RELA | Q04206 | 1/20 | 0.40 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.38 |
| ▸ | CES2 | O00748 | 1/20 | 0.37 |
| ▸ | CES1 | P23141 | 1/20 | 0.37 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL245975 | 1.00 | CYP2A6 (0.41) | CYP2A6CYP1A2ALDH1A1CYP3A4HSD17B10 | |
| SCHEMBL32672687 | 0.93 | CYP2A6 (0.46) | CYP2A6CYP1A2ALDH1A1CYP3A4HSD17B10 | |
| SCHEMBL1127475 | 0.93 | CYP2A6 (0.46) | CYP2A6CYP1A2ALDH1A1CYP3A4HSD17B10 | |
| Trifluoromethanesulfonic Acid SCHEMBL51470 | 0.81 | GPR3 (0.39) | CA1CA2CA9SMN1; SMN2 | |
| SCHEMBL759390 | 0.79 | ALDH1A1 (0.38) | CYP2A6ALDH1A1CYP3A4HSD17B10CA1 | |
| SCHEMBL12762137 | 0.79 | ALDH1A1 (0.38) | CYP2A6ALDH1A1CYP3A4HSD17B10CA1 | |
| SCHEMBL12762134 | 0.76 | ALDH1A1 (0.33) | ALDH1A1TDP1 | |
| SCHEMBL47554 | 0.76 | ALDH1A1 (0.40) | CYP2A6ALDH1A1CYP3A4HSD17B10CA1 | |
| SCHEMBL10801908 | 0.76 | ALDH1A1 (0.40) | CYP2A6ALDH1A1CYP3A4HSD17B10CA1 | |
| SCHEMBL562762 | 0.76 | LMNA (0.53) | CA1CA2CA9SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4348352-A1 | METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITHOGRAPHY COMPOSITION COMPRISING ORGANIC ACID COMPOUND, AND METHOD FOR MANUFACTURING RESIST PATTERN | Merck Patent GmbH (DE) | 2024-04-10 | — | — | EP | disclosed |
| EP-4189486-A1 | METHOD FOR USING COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, LITHOGRAPHY COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, AND METHOD FOR MANUFACTURING RESIST PATTERN | Merck Patent GmbH (DE) | 2023-06-07 | — | — | EP | disclosed |
| WO-2022253787-A1 | METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITHOGRAPHY COMPOSITION COMPRISING ORGANIC ACID COMPOUND, AND METHOD FOR MANUFACTURING RESIST PATTERN | MERCK PATENT GMBH (DE) | 2022-12-08 | — | — | WO | disclosed |
| CN-109554122-B | Curing adhesive for polarizing film, optical film, and image display device | 日东电工株式会社 | 2022-03-01 | — | — | CN | disclosed |
| WO-2022023230-A1 | METHOD FOR USING COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, LITHOGRAPHY COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, AND METHOD FOR MANUFACTURING RESIST PATTERN | MERCK PATENT GMBH (DE) | 2022-02-03 | — | — | WO | disclosed |