SCHEMBL29424116

SCHEMBL29424116

O=S(=O)(O)c1nc2ccccc2cc1O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 8/20 0.52
▸ ALDH1A1 P00352 7/20 0.52
▸ HPGD P15428 2/20 0.52
▸ GAA P10253 2/20 0.52
▸ STAT3 P40763 1/20 0.52
▸ GLA P06280 2/20 0.45
▸ MAPT P10636 1/20 0.45
▸ ACHE P22303 1/20 0.45
▸ L3MBTL1 Q9Y468 1/20 0.40
▸ NPC1 O15118 1/20 0.40
▸ RAB9A P51151 1/20 0.40
▸ IKBKB O14920 1/20 0.39
▸ CA12 O43570 1/20 0.37
▸ CA1 P00915 1/20 0.37
▸ CA2 P00918 1/20 0.37
▸ CA9 Q16790 1/20 0.37
▸ MPL P40238 1/20 0.37
▸ PRNP P04156 1/20 0.37
▸ RXFP1 Q9HBX9 1/20 0.37
▸ MGAM O43451 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL366220 1.00 KDM4E (0.52) KDM4EALDH1A1HPGDGAASTAT3
SCHEMBL17960034 0.85 ALDH1A1 (0.52) KDM4EALDH1A1HPGDGAASTAT3
SCHEMBL6734016 0.84 ALDH1A1 (0.50) KDM4EALDH1A1HPGDGAASTAT3
SCHEMBL9618515 0.82 ALDH1A1 (0.49) KDM4EALDH1A1HPGDGAASTAT3
SCHEMBL2697944 0.82 ALDH1A1 (0.49) KDM4EALDH1A1HPGDGAASTAT3
SCHEMBL9618516 0.82 ALDH1A1 (0.49) KDM4EALDH1A1HPGDGAASTAT3
Zinc Ion SCHEMBL8780468 0.82 ALDH1A1 (0.49) KDM4EALDH1A1HPGDGAASTAT3
SCHEMBL5439062 0.81 ALDH1A1 (0.46) KDM4EALDH1A1HPGDGAASTAT3
SCHEMBL29456740 0.80 ALDH1A1 (0.43) KDM4EALDH1A1HPGDGAASTAT3
SCHEMBL27825821 0.78 L3MBTL1 (0.48) KDM4EALDH1A1HPGDGAAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3973565-A1 COMPOSITION AND PROCESS FOR SELECTIVELY ETCHING A HARD MASK AND/OR AN ETCH-STOP LAYER IN THE PRESENCE OF LAYERS OF LOW-K MATERIALS, COPPER, COBALT AND/OR TUNGSTEN BASF SE (DE) 2022-03-30 — — EP disclosed
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