SCHEMBL2944668

SCHEMBL2944668

C=Cc1ccc(S(=O)(=O)O)cc1.c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.70
TSHR P16473 3/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
CYP2D6 P10635 2/20 0.43
POLB P06746 1/20 0.43
ALDH1A1 P00352 3/20 0.42
LMNA P02545 2/20 0.38
MCL1 Q07820 2/20 0.38
NT5E P21589 1/20 0.37
PTGS2 P35354 3/20 0.35
DUSP22 Q9NRW4 1/20 0.35
SNCA P37840 1/20 0.34
PTPN2 P17706 2/20 0.33
PTPN1 P18031 2/20 0.33
PTPN5 P54829 2/20 0.33
MAPK1 P28482 1/20 0.33
AKR1C2 P52895 2/20 0.33
AKR1C1 Q04828 2/20 0.33
PSMD14 O00487 1/20 0.32
PTGS1 P23219 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Styrene SCHEMBL27867074 0.88 TDP1 (0.84) TDP1TSHRSMN1; SMN2CYP2D6POLB
SCHEMBL676978 0.86 TDP1 (0.48) TDP1TSHRALDH1A1LMNAMCL1
Styrene SCHEMBL697500 0.86 TDP1 (0.81) TDP1TSHRSMN1; SMN2CYP2D6POLB
Biphenyl SCHEMBL31074210 0.84 TDP1 (0.78) TDP1TSHRSMN1; SMN2CYP2D6POLB
SCHEMBL31126649 0.84 TDP1 (1.00) TDP1TSHRSMN1; SMN2CYP2D6POLB
SCHEMBL452529 0.84 TDP1 (1.00) TDP1TSHRSMN1; SMN2CYP2D6POLB
SCHEMBL25711 0.84 TDP1 (1.00) TDP1TSHRSMN1; SMN2CYP2D6POLB
Styrene SCHEMBL7857368 0.82 TDP1 (0.73) TDP1TSHRSMN1; SMN2CYP2D6POLB
SCHEMBL17476625 0.82 TDP1 (0.95) TDP1TSHRSMN1; SMN2CYP2D6POLB
Ammonia Solution, Strong SCHEMBL814454 0.82 TDP1 (0.95) TDP1TSHRSMN1; SMN2CYP2D6POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9223204-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same FUJITSU CORPORATION (JP) 2015-12-29 US disclosed
US-20140127627-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME ITO TAKAYUKI (JP) 2014-05-08 US disclosed
US-8329379-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same FUJIFILM CORPORATION (JP) 2012-12-11 US disclosed
US-20100248143-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-09-30 US disclosed