SCHEMBL2945709

SCHEMBL2945709

CCO[Si](Cc1ccc(CCBr)cc1)(OCC)OCC

nearest known ligand 0.40

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.40
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
TAAR1 Q96RJ0 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2951768 0.89 THRA (0.34)
SCHEMBL16062870 0.85 ESR1 (0.36)
SCHEMBL2954746 0.84 TRPA1 (0.36)
SCHEMBL2951509 0.81 AKT1 (0.32) TAAR1
SCHEMBL2952167 0.80 TDP1 (0.43) TDP1MEN1KMT2ATAAR1
SCHEMBL17529688 0.80 TAAR1 (0.41) TAAR1
SCHEMBL2952480 0.79 HRH3 (0.35)
SCHEMBL2952473 0.78 THRA (0.33) MEN1KMT2A
SCHEMBL987484 0.78 AGXT (0.40) TDP1MEN1KMT2ATAAR1
SCHEMBL12458730 0.78 ESR1 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759406-B2 Process for producing polysilsesquioxane graft polymer, pressure-sensitive adhesive, and pressure-sensitive adhesive sheet LINTEC CORPORATION (JP) 2010-07-20 US disclosed
US-20080051487-A1 Process for Producing Polysilsesquioxane Graft Polymer, Pressure-Sensitive Adhesive, and Pressure-Sensitive Adhesive Sheet LINTEC CORPORATION (JP) 2008-02-28 US disclosed