Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NQO1 | P15559 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.35 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.35 |
| ▸ | ACACB | O00763 | 2/20 | 0.35 |
| ▸ | LTA4H | P09960 | 2/20 | 0.34 |
| ▸ | MAOA | P21397 | 1/20 | 0.34 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7559361 | 0.90 | MAOA (0.47) | LTA4HMAOAPTGS1 | |
| SCHEMBL8751923 | 0.86 | GPBAR1 (0.32) | ALDH1A1 | |
| SCHEMBL8751833 | 0.84 | GPBAR1 (0.43) | TSHRKDM4EMEN1KMT2A | |
| SCHEMBL8751719 | 0.83 | HIF1A (0.38) | NQO1ALDH1A1TDP1KDM4E | |
| SCHEMBL14000692 | 0.82 | POLB (0.38) | ALDH1A1TDP1MAPTMEN1KMT2A | |
| SCHEMBL7864203 | 0.78 | NQO1 (0.43) | NQO1ALDH1A1TSHRTDP1KDM4E | |
| SCHEMBL12386769 | 0.77 | KDM4E (0.35) | ALDH1A1KDM4ELTA4H | |
| SCHEMBL4899893 | 0.74 | LMNA (0.37) | TSHR | |
| SCHEMBL13599722 | 0.74 | DRD2 (0.46) | MAPTMEN1KMT2A | |
| SCHEMBL8751798 | 0.74 | CHRM2 (0.40) | ALDH1A1TSHRTDP1KDM4EMAOA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110317174-B | Hydrogen barrier agent, composition for forming hydrogen barrier film, method for producing hydrogen barrier film, and electronic device | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118043733-A | Polymer dispersed liquid crystal element and method for manufacturing same | 日产化学株式会社 | 2024-05-14 | — | — | CN | disclosed |
| CN-117321493-A | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal element | 日产化学株式会社 | 2023-12-29 | — | — | CN | disclosed |
| CN-117099040-A | Alignment film forming material, alignment film, and polymer-dispersed liquid crystal element | 日产化学株式会社 | 2023-11-21 | — | — | CN | disclosed |
| EP-2980058-B1 | COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO LTD (JP) | 2023-05-03 | — | — | EP | disclosed |
| WO-2023022155-A1 | POLYMER-DISPERSED LIQUID CRYSTAL ELEMENT AND METHOD FOR PRODUCING SAME | 日産化学株式会社 | 2023-02-23 | — | — | WO | disclosed |
| CN-111217946-B | Composition comprising a compound containing a vinyl group | 东京应化工业株式会社 | 2022-12-06 | — | — | CN | disclosed |
| WO-2022239658-A1 | LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL ELEMENT | 日産化学株式会社 | 2022-11-17 | — | — | WO | disclosed |
| WO-2022176713-A1 | LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND POLYMER-DISPERSED LIQUID CRYSTAL ELEMENT | 日産化学株式会社 | 2022-08-25 | — | — | WO | disclosed |
| WO-2022154088-A1 | ALIGNMENT FILM-FORMING MATERIAL, ALIGNMENT FILM, AND POLYMER DISPERSED-TYPE LIQUID CRYSTAL ELEMENT | 日産化学株式会社 | 2022-07-21 | — | — | WO | disclosed |
| US-5902713-A | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-05-11 | — | — | US | disclosed |
| US-5892095-A | Cyano group-containing oxime sulfonate compounds | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-04-06 | — | — | US | disclosed |
| US-5800964-A | Photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-09-01 | — | — | US | disclosed |
| EP-0848289-A1 | Negative-working chemical sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-06-17 | — | — | EP | disclosed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | disclosed |
| US-5700625-A | Negative-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-12-23 | — | — | US | disclosed |
| EP-0768572-A1 | Photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-04-16 | — | — | EP | disclosed |
| EP-0579420-B1 | Negative working resist material and pattern forming process | WAKO PURE CHEM IND LTD (JP) | 1997-03-05 | — | — | EP | disclosed |
| US-5389491-A | Negative working resist composition | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1995-02-14 | — | — | US | disclosed |
| EP-0579420-A2 | Negative working resist material and pattern forming process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1994-01-19 | — | — | EP | disclosed |