Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 5/20 | 0.56 |
| ▸ | ESR2 | Q92731 | 4/20 | 0.56 |
| ▸ | BIRC5 | O15392 | 1/20 | 0.51 |
| ▸ | ABCG2 | Q9UNQ0 | 3/20 | 0.50 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.50 |
| ▸ | NPC1 | O15118 | 2/20 | 0.47 |
| ▸ | TSHR | P16473 | 2/20 | 0.47 |
| ▸ | RAB9A | P51151 | 2/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | TP53 | P04637 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.45 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.44 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL602028 | 1.00 | ESR1 (0.56) | ESR1ESR2BIRC5ABCG2ABCB1 | |
| SCHEMBL29660599 | 0.88 | ESR1 (0.49) | ESR1ESR2BIRC5ABCG2ABCB1 | |
| SCHEMBL459006 | 0.84 | NPC1 (0.48) | ESR1ESR2BIRC5ABCG2ABCB1 | |
| SCHEMBL30392309 | 0.84 | NPC1 (0.48) | ESR1ESR2BIRC5ABCG2ABCB1 | |
| SCHEMBL9972008 | 0.84 | GABRA1 (0.47) | BIRC5NPC1TSHRRAB9ASMN1; SMN2 | |
| SCHEMBL29058865 | 0.84 | ESR1 (0.64) | ESR1ESR2ALDH1A1MEN1KMT2A | |
| SCHEMBL29274261 | 0.82 | ESR1 (0.61) | ESR1ESR2NPC1TSHRRAB9A | |
| SCHEMBL18123645 | 0.81 | ALOX5 (0.52) | BIRC5ABCG2ABCB1NPC1TSHR | |
| SCHEMBL29514776 | 0.80 | ESR1 (0.73) | ESR1ESR2TSHRRAB9ASMN1; SMN2 | |
| SCHEMBL194068 | 0.80 | ESR1 (0.73) | ESR1ESR2TSHRRAB9ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-120044756-A | Photosensitive resin composition | 旭化成株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-115524922-B | Photosensitive resin composition | 旭化成株式会社 | 2025-02-18 | — | — | CN | disclosed |
| CN-118119565-A | Structure having micro-channel, method for manufacturing same, and micro-channel device | 旭化成株式会社 | 2024-05-31 | — | — | CN | disclosed |
| CN-113156764-B | Photosensitive resin composition and resist laminate | 杭州福斯特电子材料有限公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-111316164-B | Photosensitive resin laminate and method for producing resist pattern | 旭化成株式会社 | 2023-12-29 | — | — | CN | disclosed |
| CN-116981999-A | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2023-10-31 | — | — | CN | disclosed |
| CN-111315828-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-09-29 | — | — | CN | disclosed |
| CN-111694218-B | Photosensitive resin composition and method for forming circuit pattern | 旭化成株式会社 | 2023-09-08 | — | — | CN | disclosed |
| CN-112154167-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-08-22 | — | — | CN | disclosed |
| CN-111596526-B | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2023-07-25 | — | — | CN | disclosed |
| CN-116348294-A | Photosensitive resin laminate | 旭化成株式会社 | 2023-06-27 | — | — | CN | disclosed |
| CN-115524922-A | Photosensitive resin composition | 旭化成株式会社 | 2022-12-27 | — | — | CN | disclosed |
| CN-110325913-B | Photosensitive resin composition | 旭化成株式会社 | 2022-11-01 | — | — | CN | disclosed |
| CN-115047714-A | Resist composition and laminate thereof | 杭州福斯特电子材料有限公司 | 2022-09-13 | — | — | CN | disclosed |
| CN-114667487-A | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2022-06-24 | — | — | CN | disclosed |
| CN-110114376-B | Curable composition, method for producing cured product, cured product thereof, and adhesive using same | 株式会社ADEKA | 2022-06-14 | — | — | CN | disclosed |
| WO-2022085366-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY | 旭化成株式会社 | 2022-04-28 | — | — | WO | disclosed |
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | disclosed |
| CN-114296315-A | Photosensitive resin composition | 旭化成株式会社 | 2022-04-08 | — | — | CN | disclosed |