SCHEMBL2952154

SCHEMBL2952154

CCCCC(CC)(CO)CO.Cc1cc(C(C)(C)C)c(OP(O)O)c(C(C)(C)C)c1

nearest known ligand 0.38

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.34
CYP2D6 P10635 1/20 0.34
SMN1; SMN2 Q16637 2/20 0.33
ALDH1A1 P00352 1/20 0.33
CA2 P00918 1/20 0.33
POLB P06746 1/20 0.33
TYR P14679 1/20 0.33
HSPA5 P11021 1/20 0.31
CYP2C9 P11712 1/20 0.31
CYP2C19 P33261 1/20 0.31
HIF1A Q16665 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2951542 0.90 NR5A2 (0.36)
SCHEMBL2952158 0.85 CYP3A4 (0.32) CYP3A4CYP2D6
Butylated Hydroxytoluene SCHEMBL2952160 0.83 ALDH1A1 (0.50) CYP3A4CYP2D6SMN1; SMN2ALDH1A1CA2
Butylated Hydroxytoluene SCHEMBL2952153 0.79 CA2 (0.43) CYP3A4CYP2D6SMN1; SMN2ALDH1A1CA2
SCHEMBL1664850 0.78 SMN1; SMN2 (0.50) CYP3A4CYP2D6SMN1; SMN2ALDH1A1CA2
SCHEMBL3671836 0.76 SMN1; SMN2 (0.41) CYP3A4CYP2D6SMN1; SMN2ALDH1A1CA2
SCHEMBL2951546 0.76 NR5A2 (0.32)
SCHEMBL28958825 0.75 SMN1; SMN2 (0.38) CYP3A4CYP2D6SMN1; SMN2ALDH1A1CA2
SCHEMBL7207606 0.75
SCHEMBL29000697 0.75 CYP3A4 (0.31) CYP3A4CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4251690-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS EXPOSURE TO UV-C LIGHT Cytec Industries Inc. (US) 2023-10-04 EP claimed
CN-116745353-A Compositions and methods for protecting organic polymeric materials from the deleterious effects of UV-C light exposure 塞特工业公司 2023-09-12 CN claimed
WO-2023129464-A1 POLYMER COMPOSITIONS HAVING DENSIFICATION ACCELERATORS AND ROTATIONAL MOLDING PROCESSES FOR MAKING HOLLOW ARTICLES THEREFROM CYTEC INDUSTRIES INC. (US) 2023-07-06 WO claimed
EP-2864310-B1 STABILIZER COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND METHODS OF USE CYTEC TECH CORP (US) 2022-10-26 EP claimed
US-20220212375-A1 POLYMERIC HOLLOW ARTICLES CONTAINING CHROMAN-BASED COMPOUNDS AND MADE BY ROTATIONAL MOLDING CYTEC TECHNOLOGY CORP. 2022-07-07 US claimed
WO-2022115578-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-06-02 WO claimed
US-20220169829-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-06-02 US claimed
US-20220153959-A1 POLYOLEFIN COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND MOLDED ARTICLES PRODUCED THEREFROM CYTEC TECHNOLOGY CORP. 2022-05-19 US claimed
CN-110669255-B Stabilizer compositions containing substituted chroman compounds and methods of use thereof 塞特克技术公司 2021-09-14 CN claimed
US-10975278-B2 Granular stabilizer compositions for use in polymer resins and methods of making same CYTEC INDUSTRIES INC. (US) 2021-04-13 US claimed
CN-110669255-A Stabilizer compositions containing substituted chroman compounds and methods of use thereof 塞特克技术公司 2020-01-10 CN claimed
US-20190264084-A1 GRANULAR STABILIZER COMPOSITIONS FOR USE IN POLYMER RESINS AND METHODS OF MAKING SAME CYTEC INDUSTRIES INC. (US) 2019-08-29 US claimed
EP-2864310-A1 STABILIZER COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND METHODS OF USE Cytec Technology Corp. (US) 2015-04-29 EP claimed
WO-2013188490-A1 STABILIZER COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND METHODS OF USE CYTEC TECHNOLOGY CORP. (US) 2013-12-19 WO claimed
US-20130145962-A1 Stabilizer Compositions Containing Substituted Chroman Compounds and Methods of Use CYTEC TECHNOLOGY CORP. (US) 2013-06-13 US claimed
US-20120146257-A1 PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING CYTEC TECHNOLOGY CORP. (US) 2012-06-14 US claimed
US-20100256266-A1 STABILIZER COMPOSITIONS CYTEC TECHNOLOGY CORP. (US) 2010-10-07 US claimed
US-7759417-B2 Stabilizer compositions CYTEC TECHNOLOGY CORP. (US) 2010-07-20 US claimed
US-20090149581-A1 STABILIZER COMPOSITIONS CYTEC TECHNOLOGY CORP. (US) 2009-06-11 US claimed
WO-2007136565-A1 STABILIZER COMPOSITIONS CYTEC TECHNOLOGY CORP. (US) 2007-11-29 WO claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220212375-A1 POLYMERIC HOLLOW ARTICLES CONTAINING CHROMAN-BASED COMPOUNDS AND MADE BY ROTATIONAL MOLDING RPS7, MRPS27, F7 CYP3A4 2620/4885CYP2D6 4217/4885SMN1; SMN2 3257/4885
US-20220153959-A1 POLYOLEFIN COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND MOLDED ARTICLES PRODUCED THEREFROM NOTUM, PMM2, WASF2 CYP3A4 1882/4885CYP2D6 2998/4885SMN1; SMN2 1802/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.