SCHEMBL2955282

SCHEMBL2955282

O=S(=O)(OS(c1ccccc1)(c1ccccc1)c1ccccc1)c1ccc(F)cc1

nearest known ligand 0.49

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.49
MEN1 O00255 1/20 0.49
PKM P14618 1/20 0.49
PARL Q9H300 1/20 0.42
FFAR1 O14842 2/20 0.41
FFAR4 Q5NUL3 1/20 0.41
HSD11B1 P28845 2/20 0.41
ALDH1A1 P00352 3/20 0.41
PTGS2 P35354 2/20 0.41
HPGD P15428 2/20 0.41
KDM4E B2RXH2 1/20 0.41
MAPT P10636 1/20 0.41
PTGS1 P23219 1/20 0.41
TAAR1 Q96RJ0 1/20 0.40
TSHR P16473 1/20 0.40
MAPK1 P28482 1/20 0.40
HSD17B10 Q99714 1/20 0.40
KEAP1 Q14145 1/20 0.40
NFE2L2 Q16236 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1002297 0.92 KMT2A (0.46) KMT2AMEN1PKMMAPK1KEAP1
SCHEMBL3137415 0.92 KMT2A (0.46) KMT2AMEN1PKMMAPK1KEAP1
SCHEMBL2960626 0.92 KMT2A (0.46) KMT2AMEN1PKMMAPK1KEAP1
SCHEMBL3130388 0.89 HSD11B1 (0.41) KMT2AMEN1PKMHSD11B1ALDH1A1
SCHEMBL3140036 0.89 HSD11B1 (0.41) KMT2AMEN1PKMHSD11B1ALDH1A1
SCHEMBL2958287 0.89 STAT3 (0.48) PKMFFAR1FFAR4HSD11B1ALDH1A1
SCHEMBL137133 0.88 HTR6 (0.48) KMT2APARLALDH1A1HPGDKDM4E
SCHEMBL3693053 0.87 HSD11B1 (0.50) KMT2AMEN1PKMHSD11B1ALDH1A1
SCHEMBL3194937 0.87 FFAR4 (0.41) KMT2AMEN1PKMFFAR1FFAR4
SCHEMBL3126167 0.86 PKM (0.44) KMT2AMEN1PKMFFAR1FFAR4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759045-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-07-20 US disclosed
US-20090004601-A1 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-01-01 US disclosed
US-6893794-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-17 US disclosed
US-20040018445-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-01-29 US disclosed
US-20030068573-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-10 US disclosed