SCHEMBL29566699

SCHEMBL29566699

Cc1ccc2c(O)c3cc(C)ccc3c(O)c2c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LDHA P00338 3/20 0.48
▸ LDHB P07195 3/20 0.48
▸ TRPA1 O75762 2/20 0.48
▸ TP53 P04637 2/20 0.46
▸ TDP1 Q9NUW8 1/20 0.46
▸ ALB P02768 2/20 0.44
▸ ALOX15 P16050 2/20 0.42
▸ HSD17B10 Q99714 2/20 0.42
▸ ALDH1A1 P00352 1/20 0.42
▸ PKM P14618 1/20 0.41
▸ CYP1A2 P05177 3/20 0.41
▸ ACHE P22303 2/20 0.41
▸ CYP2A6 P11509 2/20 0.41
▸ LMNA P02545 3/20 0.41
▸ MEN1 O00255 1/20 0.41
▸ GAA P10253 1/20 0.41
▸ MAPT P10636 1/20 0.41
▸ HPGD P15428 1/20 0.41
▸ ALOX12 P18054 1/20 0.41
▸ KMT2A Q03164 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21751239 1.00 LDHA (0.48) LDHALDHBTRPA1TP53TDP1
SCHEMBL29566489 0.93 PKM (0.52) LDHALDHBTRPA1TP53TDP1
SCHEMBL21751240 0.93 PKM (0.52) LDHALDHBTRPA1TP53TDP1
SCHEMBL19203130 0.92 LDHA (0.47) LDHALDHBTRPA1TP53TDP1
SCHEMBL30226666 0.85 LDHA (0.43) LDHALDHBTRPA1TP53TDP1
SCHEMBL14088237 0.80 LDHA (0.40) LDHALDHBTRPA1TP53TDP1
SCHEMBL1753459 0.80 ACHE (0.42) LDHALDHBTP53TDP1HSD17B10
SCHEMBL21920120 0.79 CYP1A2 (0.50) LDHALDHBTRPA1TP53TDP1
SCHEMBL10489924 0.79 MAPT (0.52) LDHALDHBTRPA1TP53TDP1
SCHEMBL26437114 0.79 LMNA (0.63) LDHALDHBTRPA1TP53TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113166036-B Photopolymerizing sensitizers with migration resistance 川崎化成工业株式会社 2023-10-10 — — CN disclosed
CN-110691765-B High molecular photopolymerization sensitizer 川崎化成工业株式会社 2022-05-17 — — CN disclosed
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