SCHEMBL29569170

SCHEMBL29569170

[2H]C1CCCC(=O)C12CC1CCC2C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29533016 0.95
SCHEMBL26117646 0.82 KDM1A (0.31)
SCHEMBL11412903 0.80
SCHEMBL12972100 0.80
SCHEMBL20507029 0.73 ADORA3 (0.33)
SCHEMBL11195857 0.73 LMNA (0.30)
SCHEMBL22300720 0.68 LIG1 (0.37)
SCHEMBL22300885 0.67 ALOX5AP (0.33)
SCHEMBL30106108 0.65 HSD11B1 (0.31)
SCHEMBL13645224 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117241942-B Laminate body 东洋纺株式会社 2026-05-19 CN disclosed
CN-115551713-B Laminate comprising transparent high heat resistant film 东洋纺株式会社 2025-03-21 CN disclosed
CN-115697575-B Resin film and method for producing same 东洋纺株式会社 2025-01-14 CN disclosed
CN-119072395-A Laminate body 东洋纺株式会社 2024-12-03 CN disclosed
CN-119053431-A Method for producing film 东洋纺株式会社 2024-11-29 CN disclosed
CN-114384757-B Black photosensitive resin composition, method for producing patterned cured product, and black matrix 东京应化工业株式会社 2024-11-19 CN disclosed
CN-118749013-A Resin composition, cured product, electronic component, and display device 东丽株式会社 2024-10-08 CN disclosed
CN-118613525-A Resin composition, resin composition film, cured film, and semiconductor device using same 东丽株式会社 2024-09-06 CN disclosed
CN-118578738-A Laminate body 东洋纺株式会社 2024-09-03 CN disclosed
CN-118524933-A Laminate body 东洋纺株式会社 2024-08-20 CN disclosed
CN-107561860-B Photosensitive resin composition and application thereof 东京应化工业株式会社 2022-09-27 CN disclosed
CN-107817649-B Photosensitive resin composition, polyamide resin and method for producing same, compound and method for producing same, cured film and method for producing same 东京应化工业株式会社 2022-09-16 CN disclosed
CN-108121158-B Photosensitive composition, cured film, light-emitting layer for light-emitting display element, and method for forming light-emitting layer 东京应化工业株式会社 2022-07-22 CN disclosed
CN-110249004-B Polyimide precursor composition 东京应化工业株式会社 2022-07-19 CN disclosed
CN-114761875-A Photosensitive composition, cured product, and method for producing cured product 东京应化工业株式会社 2022-07-15 CN disclosed
CN-114746808-A Photosensitive composition, cured product, and method for producing cured product 东京应化工业株式会社 2022-07-12 CN disclosed
CN-114644858-A Pigment dispersion liquid, coloring composition, and method for dispersing pigment 东京应化工业株式会社 2022-06-21 CN disclosed
CN-114644859-A Coloring composition, colored film, and method for forming colored film 东京应化工业株式会社 2022-06-21 CN disclosed
CN-114450350-A Resin composition, resin composition film, cured film, hollow structure using the same, and semiconductor device 东丽株式会社 2022-05-06 CN disclosed
CN-108389512-B Laminate, flexible device, and method for producing laminate 东京应化工业株式会社 2022-04-15 CN disclosed