SCHEMBL2957773

SCHEMBL2957773

CC(C)(C)OC(=O)Oc1[c]cccc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.45
GPR119 Q8TDV5 2/20 0.35
BCHE P06276 1/20 0.34
KDM1A O60341 1/20 0.34
CHRM2 P08172 1/20 0.33
CHRM4 P08173 1/20 0.33
CHRM1 P11229 1/20 0.33
CHRM3 P20309 1/20 0.33
ALDH1A1 P00352 2/20 0.33
TSHR P16473 1/20 0.33
HSD17B10 Q99714 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
KMT2A Q03164 2/20 0.32
MAPT P10636 1/20 0.32
CA2 P00918 1/20 0.32
KDM4E B2RXH2 1/20 0.31
MEN1 O00255 1/20 0.31
NPC1 O15118 1/20 0.31
GAA P10253 1/20 0.31
RAB9A P51151 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3453964 0.80 HSD17B10 (0.44) BCHETSHRHSD17B10KMT2AKDM4E
SCHEMBL7723112 0.79 ELANE (0.47) ELANEMAPT
SCHEMBL8040798 0.77 ELANE (0.50) ELANEKDM1ACA2
SCHEMBL5731394 0.76 TSHR (0.43) ALDH1A1TSHRHSD17B10KMT2AMAPT
SCHEMBL131380 0.76 KDM4E (0.41) ELANEALDH1A1TSHRHSD17B10TDP1
SCHEMBL5177256 0.76 PTPN1 (0.39) GPR119ALDH1A1TSHRHSD17B10KMT2A
SCHEMBL7705584 0.75 ELANE (0.53) ELANEGPR119KDM1ATDP1KMT2A
SCHEMBL8942872 0.75 TDP1 (0.43) ELANEALDH1A1HSD17B10TDP1KMT2A
SCHEMBL2223556 0.74 ELANE (0.52) ELANEKDM1ACA2
SCHEMBL7261346 0.74 L3MBTL1 (0.35) ALDH1A1TSHRHSD17B10TDP1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5908730-A Chemical-sensitization photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1999-06-01 US claimed
US-5731126-A BLEND OF POLYSILOXANE AND PHOTOACID GENERATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-03-24 US claimed
US-5569784-A FINE PATTERN; PREVENTS POST-EXPOSURE DELAY SHIN-ETSU CHEMICAL CO., LTD. (JP) 1996-10-29 US claimed
US-9585392-B2 3-phenylisoxazolin derivatives with herbicidal action BAYER CROPSCIENCE AG (DE) 2017-03-07 US disclosed
US-20150245615-A1 3-PHENYLISOXAZOLIN DERIVATIVES WITH HERBICIDAL ACTION BAYER CROPSCIENCE AG (DE) 2015-09-03 US disclosed
EP-2900645-A1 3-PHENYLISOXAZOLIN DERIVATIVES WITH HERBICIDAL ACTION Bayer CropScience AG (DE) 2015-08-05 EP disclosed
US-7785501-B2 Black resin composition for display device, and member for display device DAI NIPPON PRINTING CO., LTD. (JP) 2010-08-31 US disclosed
US-20080318018-A1 Black Resin Composition for Display Device, and Member for Display Device DAI NIPPON PRINTING CO., LTD. (JP) 2008-12-25 US disclosed
US-6030746-A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPRISES A ORGANIC SOLVENT, AN ALKALI SOLUBLE RESIN, A PHOTOACID GENERATOR AND A DISSOLUTION RATE REGULATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-02-29 US disclosed
US-5945517-A CAPABLE OF GIVING A PATTERNED RESIST LAYER WITH HIGH CONTRAST, HIGH FILM THICKNESS RETENTION, HIGH PATTERN RESOLUTION AND LATENT IMAGE STABILITY TOKYO OHKA KOGYO CO., LTD. (JP) 1999-08-31 US disclosed
US-5880169-A HAVING HIGH RESOLUTION FOR FINE PATTERNING SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-03-09 US disclosed
US-5731126-A BLEND OF POLYSILOXANE AND PHOTOACID GENERATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-03-24 US disclosed
EP-0667338-B1 Sulfonium salt and resist composition SHINETSU CHEMICAL CO (JP) 1998-01-07 EP disclosed
US-5691396-A POLYHYDROXYBENZYLSILSESQUIOXANE SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-11-25 US disclosed
US-5612170-A SILICONE, PHOTO ACID GENERATOR, DISSOLUTION INHIBITOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-03-18 US disclosed
US-5585223-A RADIATION ACTIVATION; HEATING; ETCHING CORNELL RESEARCH FOUNDATION, INC. (US) 1996-12-17 US disclosed
US-5569784-A FINE PATTERN; PREVENTS POST-EXPOSURE DELAY SHIN-ETSU CHEMICAL CO., LTD. (JP) 1996-10-29 US disclosed
US-5532106-A MICROELECTRONICS WITH POLYMERS, PHOTOACTIVE AGENTS AND DISSOLUTION INHIBITORS CORNELL RESEARCH FOUNDATION, INC. (US) 1996-07-02 US disclosed
EP-0667338-A1 Sulfonium salt and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 1995-08-16 EP disclosed
US-5262283-A Method for producing a resist structure SIEMENS AKTIENGESELLSCHAFT (DE) 1993-11-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150245615-A1 3-PHENYLISOXAZOLIN DERIVATIVES WITH HERBICIDAL ACTION CYP4X1, CBR3, PAOX ELANE 4202/4885GPR119 478/4885BCHE 634/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.