Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 3/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | PSEN1 | P49768 | 2/20 | 0.38 |
| ▸ | PSEN2 | P49810 | 2/20 | 0.38 |
| ▸ | APH1B | Q8WW43 | 2/20 | 0.38 |
| ▸ | NCSTN | Q92542 | 2/20 | 0.38 |
| ▸ | APH1A | Q96BI3 | 2/20 | 0.38 |
| ▸ | PSENEN | Q9NZ42 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | DDB1 | Q16531 | 1/20 | 0.36 |
| ▸ | CRBN | Q96SW2 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21612913 | 0.87 | ALDH1A1 (0.34) | PTPN1MAPTHPGDLMNAPOLB | |
| SCHEMBL21612893 | 0.86 | ALDH1A1 (0.35) | PTPN1MAPTHPGDLMNAPOLB | |
| SCHEMBL16390959 | 0.84 | HDAC8 (0.36) | LMNAKDM4EALDH1A1PTPRC | |
| SCHEMBL2565533 | 0.82 | KMT2A (0.40) | MAPTLMNAPOLBKDM4EALDH1A1 | |
| SCHEMBL1444265 | 0.79 | ALDH1A1 (0.48) | PTPN1MAPTHPGDLMNANPSR1 | |
| SCHEMBL7048126 | 0.79 | HSD11B1 (0.35) | POLBALDH1A1TSHR | |
| SCHEMBL11850746 | 0.78 | KMT2A (0.39) | HPGDPOLBCYP2C9CYP2C19KDM4E | |
| SCHEMBL1387698 | 0.78 | TNFRSF1A (0.34) | PTPN1MAPTHPGDLMNAPOLB | |
| SCHEMBL21883674 | 0.77 | PSEN1 (0.46) | PTPN1MAPTHPGDLMNAPOLB | |
| SCHEMBL22656552 | 0.76 | POLB (0.50) | PTPN1MAPTHPGDLMNAPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5908730-A | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-06-01 | — | — | US | claimed |
| US-5847218-A | Sulfonium salts and chemically amplified positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-12-08 | — | — | US | claimed |
| US-5731126-A | BLEND OF POLYSILOXANE AND PHOTOACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-03-24 | — | — | US | claimed |
| EP-1319197-B1 | ANTIREFLECTIVE COMPOSITION | SHIPLEY CO LLC (US) | 2007-06-06 | — | — | EP | disclosed |
| US-7147801-B2 | Ink jet ink composition and method for security marking | VIDEOJET TECHNOLOGIES INC. (US) | 2006-12-12 | — | — | US | disclosed |
| US-6861209-B2 | Method to enhance resolution of a chemically amplified photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-03-01 | — | — | US | disclosed |
| US-20040106070-A1 | Method to enhance resolution of a chemically amplified photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-06-03 | — | — | US | disclosed |
| WO-2002023274-A9 | PHOTORESIST COMPOSITION | SHIPLEY CO LLC (US) | 2003-11-13 | — | — | WO | disclosed |
| US-6645695-B2 | Crosslinked polymeric particles and a photoactive component, wherein the polymeric particles comprise cleavable group(s); free of surfactant; forming relief images | SHIPLEY COMPANY, L.L.C. | 2003-11-11 | — | — | US | disclosed |
| EP-1319197-A2 | ANTIREFLECTIVE COMPOSITION | Shipley Company LLC (US) | 2003-06-18 | — | — | EP | disclosed |
| US-6534243-B1 | A coating containing a cleaving compound to trim resist features; permitting a deprotection region to form within an inner portion of the patterned resist; removing coating and deprotection region to provide a second patterned feature | ADVANCED MICRO DEVICES, INC. | 2003-03-18 | — | — | US | disclosed |
| WO-2002023274-A2 | PHOTORESIST COMPOSITION | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-21 | — | — | WO | disclosed |
| US-6274289-B1 | Chemical resist thickness reduction process | ADVANCED MICRO DEVICES, INC. | 2001-08-14 | — | — | US | disclosed |
| US-6030746-A | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPRISES A ORGANIC SOLVENT, AN ALKALI SOLUBLE RESIN, A PHOTOACID GENERATOR AND A DISSOLUTION RATE REGULATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-02-29 | — | — | US | disclosed |
| US-5945517-A | CAPABLE OF GIVING A PATTERNED RESIST LAYER WITH HIGH CONTRAST, HIGH FILM THICKNESS RETENTION, HIGH PATTERN RESOLUTION AND LATENT IMAGE STABILITY | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-08-31 | — | — | US | disclosed |
| US-5856561-A | Bisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-01-05 | — | — | US | disclosed |
| US-5847218-A | Sulfonium salts and chemically amplified positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-12-08 | — | — | US | disclosed |
| US-5731126-A | BLEND OF POLYSILOXANE AND PHOTOACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-03-24 | — | — | US | disclosed |
| US-5691396-A | POLYHYDROXYBENZYLSILSESQUIOXANE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-11-25 | — | — | US | disclosed |
| US-5612170-A | SILICONE, PHOTO ACID GENERATOR, DISSOLUTION INHIBITOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-03-18 | — | — | US | disclosed |