SCHEMBL29634717

SCHEMBL29634717

O=C1C(Cl)=C(Cl)C(Cl)(Cl)c2ccccc21

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 1/20 0.52
DNMT1 P26358 1/20 0.52
DNMT3L Q9UJW3 1/20 0.52
DNMT3A Q9Y6K1 1/20 0.52
S100A4 P26447 3/20 0.52
KMT2A Q03164 5/20 0.47
LMNA P02545 5/20 0.47
MAPT P10636 5/20 0.47
HTT P42858 4/20 0.47
ALDH1A1 P00352 3/20 0.47
MAPK1 P28482 3/20 0.47
KDM4E B2RXH2 3/20 0.47
POLB P06746 3/20 0.47
HPGD P15428 2/20 0.47
TDP1 Q9NUW8 2/20 0.47
BLM P54132 2/20 0.47
PKM P14618 1/20 0.47
ALOX12 P18054 1/20 0.47
MPI P34949 1/20 0.47
KCNQ2 O43526 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6415438 1.00 IDO1 (0.52) IDO1DNMT1DNMT3LDNMT3AS100A4
SCHEMBL9126309 0.81 S100A4 (0.61) IDO1DNMT1DNMT3LDNMT3AS100A4
SCHEMBL9164047 0.71 S100A4 (0.55) IDO1DNMT1DNMT3LDNMT3AS100A4
SCHEMBL6836847 0.70 S100A4 (0.65) S100A4KMT2ALMNAMAPTHTT
Dichlon SCHEMBL9751236 0.70 IDO1 (1.00) IDO1DNMT1DNMT3LDNMT3AS100A4
Dichlon SCHEMBL29360991 0.70 IDO1 (1.00) IDO1DNMT1DNMT3LDNMT3AS100A4
Dichlon SCHEMBL45723 0.70 IDO1 (1.00) IDO1DNMT1DNMT3LDNMT3AS100A4
SCHEMBL29612259 0.70 S100A4 (0.65) S100A4KMT2ALMNAMAPTHTT
SCHEMBL2599169 0.68 S100A4 (1.00) IDO1DNMT1DNMT3LDNMT3AS100A4
SCHEMBL11454552 0.68 S100A4 (0.42) IDO1DNMT1DNMT3LDNMT3AS100A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023197551-A1 LITHOGRAPHY APPARATUS AND LITHOGRAPHY SYSTEM 西湖大学 2023-10-19 WO disclosed
WO-2023197553-A1 MASK, PHOTOLITHOGRAPHIC DEVICE, MANUFACTURING METHOD FOR MASK, AND MASK-BASED PHOTOLITHOGRAPHY METHOD 西湖大学 2023-10-19 WO disclosed
CN-114690534-A Mask, photoetching device, mask manufacturing method and photoetching method based on mask 西湖大学 2022-07-01 CN disclosed
CN-114675507-A Lithographic apparatus and lithographic system 西湖大学 2022-06-28 CN disclosed