SCHEMBL29645006

SCHEMBL29645006

COC(=O)COc1ccc(C(=O)C(F)(F)F)cc1

nearest known ligand 0.56

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MLYCD O95822 5/20 0.56
PTGS2 P35354 2/20 0.50
MAPT P10636 4/20 0.49
POLB P06746 2/20 0.48
PDK2 Q15119 1/20 0.47
ALDH1A1 P00352 1/20 0.47
CYP2C9 P11712 1/20 0.47
CYP2C19 P33261 1/20 0.47
KMT2A Q03164 2/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
GAA P10253 1/20 0.46
PPARG P37231 1/20 0.45
PPARD Q03181 1/20 0.45
PPARA Q07869 1/20 0.45
MEN1 O00255 1/20 0.45
NPC1 O15118 1/20 0.44
RAB9A P51151 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25846701 0.85 MLYCD (0.57) MLYCDL3MBTL1GAA
SCHEMBL8673136 0.84 PTGS2 (0.50) PTGS2MAPTPOLBALDH1A1CYP2C9
SCHEMBL7327533 0.84 PTGS2 (0.50) PTGS2MAPTPOLBALDH1A1CYP2C9
SCHEMBL2116437 0.82 PTGS2 (0.66) PTGS2MAPTPOLBALDH1A1CYP2C9
SCHEMBL30219467 0.82 PTGS2 (0.46) PTGS2MAPTPOLBPDK2ALDH1A1
SCHEMBL10299626 0.81 PTGS2 (0.57) PTGS2MAPTPOLBALDH1A1CYP2C9
SCHEMBL10299624 0.80 CES1 (0.51) PTGS2MAPTPOLBALDH1A1CYP2C9
SCHEMBL13279565 0.80 MEN1 (0.63) PTGS2MAPTPOLBPDK2ALDH1A1
SCHEMBL6655754 0.80 MLYCD (0.49) MLYCDMAPTL3MBTL1
SCHEMBL586420 0.80 ALDH1A1 (0.64) PTGS2MAPTPDK2ALDH1A1CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114600045-A Photosensitive resin composition, photosensitive dry film and pattern forming method 信越化学工业株式会社 2022-06-07 CN disclosed