SCHEMBL2965398

SCHEMBL2965398

COc1ccc(S(=O)(=O)ON2C(=O)CCC2=O)c([N+](=O)[O-])c1

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.46
MCOLN3 Q8TDD5 1/20 0.46
ALDH1A1 P00352 5/20 0.45
LMNA P02545 1/20 0.45
MAPK1 P28482 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.43
CYP3A4 P08684 1/20 0.43
CYP2C19 P33261 1/20 0.43
HTT P42858 1/20 0.43
MEN1 O00255 3/20 0.43
KMT2A Q03164 3/20 0.43
VDR P11473 1/20 0.43
GAA P10253 2/20 0.42
SLC40A1 Q9NP59 1/20 0.42
PARL Q9H300 2/20 0.41
RELA Q04206 1/20 0.41
MAPT P10636 2/20 0.41
KDM4E B2RXH2 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2963233 0.79 PARL (0.55) POLBALDH1A1LMNASMN1; SMN2MEN1
SCHEMBL65074 0.76 GAA (0.66) POLBALDH1A1HTTVDRGAA
SCHEMBL3919900 0.75 VCAM1 (0.60) POLBMCOLN3ALDH1A1LMNAMAPK1
SCHEMBL8960247 0.75 POLB (0.53) POLBMCOLN3ALDH1A1LMNAMAPK1
SCHEMBL6038596 0.74 POLB (0.52) POLBMCOLN3ALDH1A1LMNAMAPK1
SCHEMBL3906545 0.74 POLB (0.52) POLBMCOLN3ALDH1A1LMNAMAPK1
SCHEMBL540736 0.74 POLB (0.52) POLBMCOLN3ALDH1A1LMNAMAPK1
SCHEMBL6038599 0.74 POLB (0.52) POLBMCOLN3ALDH1A1LMNAMAPK1
Water SCHEMBL3157352 0.73 POLB (0.51) POLBMCOLN3ALDH1A1LMNAMAPK1
SCHEMBL12727381 0.73 POLB (0.51) POLBMCOLN3ALDH1A1LMNAMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6569596-B1 Photoresists comprising N-(ethylsulfonyloxy)succinimide, novolaks, curing agents and an acid generators such as alpha -(hexylsulfonyloxyimino)-4-methoxybenzyl cyanide; integrated circuits; semiconductors SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-05-27 US claimed
US-7759045-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-07-20 US disclosed
US-20090004601-A1 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-01-01 US disclosed
US-6893794-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-17 US disclosed
US-20040018445-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-01-29 US disclosed
US-6569596-B1 Photoresists comprising N-(ethylsulfonyloxy)succinimide, novolaks, curing agents and an acid generators such as alpha -(hexylsulfonyloxyimino)-4-methoxybenzyl cyanide; integrated circuits; semiconductors SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-05-27 US disclosed