SCHEMBL2966008

SCHEMBL2966008

Cc1ccc(S(OS(=O)(=O)c2ccc(C)cc2)(c2ccc(C)cc2)c2ccc(C)cc2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 3/20 0.52
CA1 P00915 3/20 0.48
CA2 P00918 3/20 0.48
CA12 O43570 1/20 0.48
CA3 P07451 1/20 0.48
CA6 P23280 1/20 0.48
CA5A P35218 1/20 0.48
CA7 P43166 1/20 0.48
CA9 Q16790 1/20 0.48
CA5B Q9Y2D0 1/20 0.48
DNMT1 P26358 1/20 0.47
TLR9 Q9NR96 1/20 0.46
VDR P11473 1/20 0.46
SMN1; SMN2 Q16637 3/20 0.45
ALDH1A1 P00352 5/20 0.44
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44
G6PD P11413 2/20 0.44
TDP1 Q9NUW8 2/20 0.44
KDM4E B2RXH2 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2955938 0.92 VDR (0.49) GAACA1CA2CA12CA3
SCHEMBL2962485 0.92 VDR (0.49) GAACA1CA2CA12CA3
SCHEMBL3144536 0.92 VDR (0.49) GAACA1CA2CA12CA3
SCHEMBL2964106 0.92 VDR (0.49) GAACA1CA2CA12CA3
SCHEMBL64190 0.92 VDR (0.49) GAACA1CA2CA12CA3
SCHEMBL8862178 0.90 MEN1 (0.49) GAACA1CA2CA12CA3
SCHEMBL2964009 0.90 ACHE (0.50) GAACA1CA2CA12CA3
SCHEMBL503950 0.90 ACHE (0.50) GAACA1CA2CA12CA3
SCHEMBL5709627 0.89 MEN1 (0.51) CA1CA2CA12CA9SMN1; SMN2
SCHEMBL453521 0.89 ACHE (0.54) SMN1; SMN2ALDH1A1MEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759045-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-07-20 US disclosed
US-20090004601-A1 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-01-01 US disclosed
US-6893794-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-17 US disclosed
US-20040018445-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-01-29 US disclosed
US-20030068573-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-10 US disclosed
US-20020196896-A1 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-12-26 US disclosed
EP-1193553-A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-04-03 EP disclosed
US-6280902-B1 RESIN CONVERTED TO ALKALI SOLUBLE TO ALKALI INSOLUBLE OR ALKALI SLIGHTLY ACID SOLUBLE, AN ACID GENERATOR AND NITROGEN CYCLIC COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-28 US disclosed
EP-1058153-A1 Positive working photoresist compositions SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-12-06 EP disclosed