Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | VDR | P11473 | 1/20 | 0.49 |
| ▸ | HTT | P42858 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | GAA | P10253 | 4/20 | 0.46 |
| ▸ | BCHE | P06276 | 1/20 | 0.46 |
| ▸ | ACHE | P22303 | 1/20 | 0.46 |
| ▸ | CA12 | O43570 | 4/20 | 0.46 |
| ▸ | CA9 | Q16790 | 4/20 | 0.46 |
| ▸ | CA1 | P00915 | 2/20 | 0.46 |
| ▸ | CA2 | P00918 | 2/20 | 0.46 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.45 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.45 |
| ▸ | MEN1 | O00255 | 4/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2962485 | 1.00 | VDR (0.49) | VDRHTTSMN1; SMN2GAABCHE | |
| SCHEMBL2955938 | 1.00 | VDR (0.49) | VDRHTTSMN1; SMN2GAABCHE | |
| SCHEMBL3144536 | 1.00 | VDR (0.49) | VDRHTTSMN1; SMN2GAABCHE | |
| SCHEMBL2964106 | 1.00 | VDR (0.49) | VDRHTTSMN1; SMN2GAABCHE | |
| SCHEMBL2966008 | 0.92 | GAA (0.52) | VDRHTTSMN1; SMN2GAACA12 | |
| SCHEMBL3137415 | 0.92 | KMT2A (0.46) | VDRHTTSMN1; SMN2GAABCHE | |
| SCHEMBL3136307 | 0.92 | TDP1 (0.51) | VDRHTTSMN1; SMN2GAABCHE | |
| SCHEMBL3135353 | 0.92 | TDP1 (0.51) | VDRHTTSMN1; SMN2GAABCHE | |
| SCHEMBL1002297 | 0.92 | KMT2A (0.46) | VDRHTTSMN1; SMN2GAABCHE | |
| SCHEMBL3135083 | 0.92 | MEN1 (0.44) | VDRHTTSMN1; SMN2GAABCHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2417 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119487452-A | Enhanced EUV photoresist and method of use thereof | 亚历克斯·P·G·罗宾逊 | 2025-02-18 | — | — | CN | claimed |
| US-20240294771-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | Tan Kah Kee Innovation Laboratory (CN) | 2024-09-05 | — | — | US | claimed |
| CN-118244576-A | Photosensitive resin composition and cured film thereof | 罗门哈斯电子材料韩国有限公司 | 2024-06-25 | — | — | CN | claimed |
| CN-117452768-A | Composition for immersion photoresist top coating | 徐州博康信息化学品有限公司 | 2024-01-26 | — | — | CN | claimed |
| WO-2023070957-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | 嘉庚创新实验室 | 2023-05-04 | — | — | WO | claimed |
| CN-113913075-B | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-09-20 | — | — | CN | claimed |
| CN-113913075-A | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-01-11 | — | — | CN | claimed |
| CN-104823110-B | Photosensitive resin composition, photosensitive film, and method for forming resist pattern | 昭和电工材料株式会社 | 2021-06-04 | — | — | CN | claimed |
| CN-108939280-B | Preparation method of SU8 microneedle array patch | 杭州电子科技大学 | 2021-05-18 | — | — | CN | claimed |
| CN-104914672-B | Bottom anti-reflection composition based on molecular glass containing polyhydroxy structure and application thereof | 中国科学院化学研究所 | 2020-08-21 | — | — | CN | claimed |
| US-20080113294-A1 | Compound for Resist and Radiation-Sensitive Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-05-15 | — | — | US | claimed |
| EP-1830228-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-09-05 | — | — | EP | claimed |
| US-6730451-B2 | FLUOROACRYLATE POLYMERS; TRANSPARENCY; PREVENTING NEGATIVE WORKING; LOW ABSORPTION OF FLUORINE EXCIMER LASER LIGHT; HIGH TRANSMITTANCE TO VACUUM ULTRAVIOLET RADITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-05-04 | — | — | US | claimed |
| US-6660447-B2 | Copolymers of fluorinated vinyl phenol units and acrylonitrile units has high transmittance to VUV radiation | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-09 | — | — | US | claimed |
| US-6436606-B1 | POLYMERS AND PHOTORESISTS COATING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-20 | — | — | US | claimed |
| EP-0827970-B1 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT FINANCE BVI LTD (VG) | 2001-09-26 | — | — | EP | claimed |
| WO-2001029837-A1 | MEDIUM FOR FLUORESCENT READ-ONLY MULTILAYER OPTICAL INFORMATION CARRIER AND ITS MANUFACTURING METHOD | TRID STORE IP, LLC (US) | 2001-04-26 | — | — | WO | claimed |
| US-5852128-A | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT AG (CH) | 1998-12-22 | — | — | US | claimed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | claimed |
| US-5629134-A | SOLVENT, ALKALI SOLUBLE RESIN, ACID GENERATOR, PYRIDINE SALT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-05-13 | — | — | US | claimed |