SCHEMBL296885

SCHEMBL296885

O=C(NO)c1ccc(F)cc1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC6 Q9UBN7 7/20 0.60
HDAC1 Q13547 5/20 0.60
HDAC8 Q9BY41 3/20 0.60
HDAC2 Q92769 3/20 0.60
HDAC3 O15379 4/20 0.58
CA1 P00915 2/20 0.58
NCOR2 Q9Y618 2/20 0.58
CA12 O43570 1/20 0.58
IDO1 P14902 1/20 0.58
ALOX15 P16050 1/20 0.58
CA9 Q16790 1/20 0.58
HDAC7 Q8WUI4 1/20 0.58
HSD17B10 Q99714 1/20 0.58
MEN1 O00255 1/20 0.57
KMT2A Q03164 1/20 0.57
CES2 O00748 1/20 0.56
CES1 P23141 1/20 0.56
PTPN1 P18031 1/20 0.55
HDAC11 Q96DB2 1/20 0.55
CA2 P00918 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13485809 0.88 CA1 (0.58) HDAC6HDAC1HDAC8HDAC2CA1
SCHEMBL3673435 0.87 HDAC6 (0.75) HDAC6HDAC1HDAC8HDAC2HDAC3
SCHEMBL6569859 0.83 HDAC6 (0.73) HDAC6HDAC1HDAC8HDAC2HDAC3
SCHEMBL5127523 0.82 MEN1 (0.59) CA1MEN1KMT2ACES2CES1
SCHEMBL2287134 0.82 MAOA (0.68) HDAC1HDAC2HDAC3MEN1KMT2A
SCHEMBL29039983 0.82 TNFRSF1A (0.80) HDAC1
SCHEMBL20740179 0.82 HDAC6 (0.51) HDAC6HDAC1HDAC8HDAC2HDAC3
SCHEMBL30690063 0.80 HDAC1 (0.72) HDAC6HDAC1HDAC8HDAC2HDAC3
SCHEMBL15850962 0.80 RAB9A (0.87) HDAC6HDAC8HDAC2HDAC3CA1
SCHEMBL25060935 0.79 HDAC1 (0.75) HDAC6HDAC1HDAC8HDAC2HDAC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240319601-A1 METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2024-09-26 US claimed
US-11981648-B2 Method for the synthesis of 3-R-1,4,2-dioxazol-5-ones TESLA, INC. (US) 2024-05-14 US claimed
CN-117597628-A Method for forming pattern 三星SDI株式会社 2024-02-23 CN claimed
US-20240019784-A1 METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING STEP OF DEVELOPING USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2024-01-18 US claimed
CN-114195772-B 1,2, 4-oxadiazole derivative containing 1,3, 4-thiadiazole unit, and preparation method and application thereof 贵州大学 2023-06-30 CN claimed
US-20230029852-A1 METHOD FOR THE SYNTHESIS OF 3-R-1,4,2-DIOXAZOL-5-ONES PANASONIC HOLDINGS CORPORATION (JP) 2023-02-02 US claimed
WO-2023003215-A1 METHOD OF FORMING PATTERNS 삼성에스디아이 주식회사 2023-01-26 WO claimed
US-20250297135-A1 CERIA AND HYDROXAMIC ACID CMP COMPOSITION ENTEGRIS, INC. 2025-09-25 US disclosed
US-20240319601-A1 METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2024-09-26 US disclosed
CN-115160097-B Method for synthesizing amide by reducing N-O bond by thioacetic acid 温州大学 2024-05-28 CN disclosed
CN-117597628-A Method for forming pattern 三星SDI株式会社 2024-02-23 CN disclosed
US-20240019784-A1 METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING STEP OF DEVELOPING USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2024-01-18 US disclosed
CN-114933573-B 3-substituted-1, 2, 4-oxadiazole-5-carboxylic acid derivative, and preparation method and application thereof 贵州大学 2023-10-20 CN disclosed
US-20060196848-A1 Readily deinkable toners MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT 2006-09-07 US disclosed
US-20060144824-A1 Method of polishing a silicon-containing dielectric CABOT MICROELECTRONICS CORPORATION (US) 2006-07-06 US disclosed
US-7071105-B2 Method of polishing a silicon-containing dielectric CABOT MICROELECTRONICS CORPORATION (US) 2006-07-04 US disclosed
EP-1601735-A1 METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC Cabot Microelectronics Corporation (US) 2005-12-07 EP disclosed
WO-2004069947-A1 METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC CABOT MICROELECTRONICS CORPORATION (US) 2004-08-19 WO disclosed
US-20040152309-A1 Method of polishing a silicon-containing dielectric CABOT MICROELECTRONICS CORPORATION 2004-08-05 US disclosed
WO-1998015541-A1 NOVEL ISOXAZOL DERIVATIVES, PHARMACEUTICAL COMPOSITIONS CONTAINING THE SAME, AND A PROCESS FOR THE PREPARATION OF THE NOVEL COMPOUNDS EGIS Gyógyszergyár Rt. (HU) 1998-04-16 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11981648-B2 Method for the synthesis of 3-R-1,4,2-dioxazol-5-ones CYP4X1, DDO, CYP4B1 HDAC6 1947/4885HDAC1 1595/4885HDAC8 2130/4885
US-20230029852-A1 METHOD FOR THE SYNTHESIS OF 3-R-1,4,2-DIOXAZOL-5-ONES CYP4X1, DDO, CYP4B1 HDAC6 1947/4885HDAC1 1595/4885HDAC8 2130/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.