Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.35 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.35 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.35 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.35 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.35 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.35 |
| ▸ | ELANE | P08246 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1470735 | 1.00 | ALDH1A1 (0.35) | ALDH1A1CYP1A2KDM4ECYP2C19MEN1 | |
| SCHEMBL16569894 | 0.91 | TSHR (0.35) | ALDH1A1CYP1A2KDM4ECYP2C19MEN1 | |
| SCHEMBL14514096 | 0.88 | ELANE (0.39) | ALDH1A1CYP1A2KDM4ECYP2C19MEN1 | |
| SCHEMBL718325 | 0.88 | ALDH1A1 (0.31) | ALDH1A1CYP1A2KDM4ECYP2C19MEN1 | |
| SCHEMBL5014197 | 0.85 | CYP1A2 (0.38) | ALDH1A1CYP1A2KDM4ECYP2C19MEN1 | |
| SCHEMBL656268 | 0.84 | ELANE (0.37) | ALDH1A1CYP1A2KDM4EMAPTCYP3A4 | |
| SCHEMBL652147 | 0.82 | ELANE (0.41) | ALDH1A1CYP1A2KDM4ECYP2C19MEN1 | |
| SCHEMBL15274207 | 0.79 | L3MBTL1 (0.42) | ALDH1A1CYP1A2KDM4EMEN1MAPT | |
| SCHEMBL20534467 | 0.78 | CYP1A2 (0.41) | ALDH1A1CYP1A2KDM4ECYP2C19MEN1 | |
| SCHEMBL30620185 | 0.78 | CYP1A2 (0.41) | ALDH1A1CYP1A2KDM4ECYP2C19MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116034127-B | Silicon-containing monomer mixture, polysiloxane, resin composition, photosensitive resin composition, cured film, method for producing cured film, pattern cured film, and method for producing pattern cured film | 中央硝子株式会社 | 2024-03-01 | — | — | CN | disclosed |
| CN-116601210-A | Resin composition, cured film, method for producing cured film, substrate with multilayer film, method for producing substrate with pattern, photosensitive resin composition, method for producing pattern cured film, method for producing polymer, and method for producing resin composition | 中央硝子株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-116601244-A | Coating liquid for optical member, polymer, cured film, photosensitive coating liquid, pattern cured film, optical member, solid-state imaging element, display device, silicone compound, stabilizer used in coating liquid, method for producing cured film, method for producing pattern cured film, and method for producing polymer | 中央硝子株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-116034127-A | Silicon-containing monomer mixture, polysiloxane, resin composition, photosensitive resin composition, cured film, method for producing cured film, pattern cured film, and method for producing pattern cured film | 中央硝子株式会社 | 2023-04-28 | — | — | CN | disclosed |
| US-20230037301-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN STRUCTURE AND METHOD FOR PRODUCING PATTERNED CURED FILM | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-02-09 | — | — | US | disclosed |
| CN-111040204-B | Force-induced response dynamic polymer and application thereof | 厦门天策材料科技有限公司 | 2023-01-24 | — | — | CN | disclosed |
| CN-115244465-A | Negative photosensitive resin composition, pattern structure, and method for producing pattern cured film | 中央硝子株式会社 | 2022-10-25 | — | — | CN | disclosed |
| CN-109791352-B | Photosensitive resin composition, method for producing conductive pattern, substrate, touch panel, and display | 东丽株式会社 | 2022-07-29 | — | — | CN | disclosed |
| CN-114585630-A | Silicon compound, reactive material, resin composition, photosensitive resin composition, cured film, method for producing cured film, patterned cured film, and method for producing patterned cured film | 中央硝子株式会社 | 2022-06-03 | — | — | CN | disclosed |