Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2C | P28335 | 2/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.51 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
| ▸ | MAP1LC3B | Q9GZQ8 | 1/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.42 |
| ▸ | ALOX15B | O15296 | 1/20 | 0.42 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.42 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | PBRM1 | Q86U86 | 1/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.40 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.40 |
| ▸ | DRD2 | P14416 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30762101 | 0.83 | HTR2C (0.55) | HTR2CL3MBTL1TDP1KMT2AMEN1 | |
| SCHEMBL426392 | 0.83 | HTR2C (0.55) | HTR2CL3MBTL1TDP1KMT2AMEN1 | |
| SCHEMBL1269222 | 0.83 | PDE4A (0.55) | HTR2CKMT2AMEN1CYP3A4CYP2C9 | |
| SCHEMBL12676477 | 0.80 | MAPT (0.60) | HTR2CL3MBTL1TDP1KMT2AMEN1 | |
| SCHEMBL29496818 | 0.80 | MAPT (0.60) | HTR2CL3MBTL1TDP1KMT2AMEN1 | |
| SCHEMBL5354030 | 0.79 | TDP1 (0.59) | HTR2CL3MBTL1TDP1KMT2AMEN1 | |
| SCHEMBL31348863 | 0.79 | LMNA (0.51) | KMT2AMAPTLMNATSHRHTT | |
| SCHEMBL30817379 | 0.79 | ALDH1A1 (0.52) | HTR2CL3MBTL1KMT2AMEN1MAP1LC3B | |
| SCHEMBL25819902 | 0.78 | DDB1 (0.44) | LMNADDB1CRBN | |
| SCHEMBL25819000 | 0.78 | MGLL (0.46) | HTR2CCYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103210047-B | The diazene * dioxide of the substitution containing N and/or the aqueous polishing composition of N '-hydroxyls-diazene * oxide salts | 巴斯夫欧洲公司 | 2018-07-17 | — | — | CN | disclosed |
| EP-2331649-B1 | METHODS AND COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES | CABOT MICROELECTRONICS CORP (US) | 2018-06-13 | — | — | EP | disclosed |
| CN-1742066-B | The siliceous dielectric method of polishing | CABOT MICROELECTRONICS CORP. (US) | 2015-10-21 | — | — | CN | disclosed |
| CN-103080256-B | Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films | BASF SE | 2015-06-24 | — | — | CN | disclosed |
| US-8597540-B2 | Compositions for polishing silicon-containing substrates | CABOT MICROELECTRONICS CORPORATION (US) | 2013-12-03 | — | — | US | disclosed |
| US-20130200039-A1 | AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS | BASF SE (DE) | 2013-08-08 | — | — | US | disclosed |
| US-8486169-B2 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION (US) | 2013-07-16 | — | — | US | disclosed |
| US-20130168348-A1 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC AND POLYSILICON FILMS | BASF SE (DE) | 2013-07-04 | — | — | US | disclosed |
| US-20130171824-A1 | PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC FILMS AND POLYSILICON AND/OR SILICON NITRIDE FILMS | BASF SE (DE) | 2013-07-04 | — | — | US | disclosed |
| US-20120280170-A1 | COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES | CABOT MICROELECTRONICS CORPORATION | 2012-11-08 | — | — | US | disclosed |
| WO-2010014180-A2 | METHODS AND COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES | CABOT MICROELECTRONICS CORPORATION (US) | 2010-02-04 | — | — | WO | disclosed |
| US-20100029181-A1 | Methods and compositions for polishing silicon-containing substrates | CMC MATERIALS LLC | 2010-02-04 | — | — | US | disclosed |
| US-20090029633-A1 | METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC | CABOT MICROELECTRONICS CORPORATION (US) | 2009-01-29 | — | — | US | disclosed |
| US-7442645-B2 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION (US) | 2008-10-28 | — | — | US | disclosed |
| US-20060196848-A1 | Readily deinkable toners | MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT | 2006-09-07 | — | — | US | disclosed |
| US-20060144824-A1 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION (US) | 2006-07-06 | — | — | US | disclosed |
| US-7071105-B2 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION (US) | 2006-07-04 | — | — | US | disclosed |
| EP-1601735-A1 | METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC | Cabot Microelectronics Corporation (US) | 2005-12-07 | — | — | EP | disclosed |
| WO-2004069947-A1 | METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC | CABOT MICROELECTRONICS CORPORATION (US) | 2004-08-19 | — | — | WO | disclosed |
| US-20040152309-A1 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION | 2004-08-05 | — | — | US | disclosed |