Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | KAT6A | Q92794 | 6/20 | 0.42 |
| ▸ | F2 | P00734 | 3/20 | 0.40 |
| ▸ | PRSS1 | P07477 | 3/20 | 0.40 |
| ▸ | PRSS2 | P07478 | 3/20 | 0.40 |
| ▸ | PRSS3 | P35030 | 3/20 | 0.40 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.38 |
| ▸ | CTSS | P25774 | 1/20 | 0.38 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6743182 | 1.00 | MAPT (0.54) | MAPTLMNAKDM4EALDH1A1KAT6A | |
| SCHEMBL5369874 | 1.00 | MAPT (0.54) | MAPTLMNAKDM4EALDH1A1KAT6A | |
| SCHEMBL5372313 | 0.89 | MAPT (0.49) | MAPTLMNAKDM4EALDH1A1KAT6A | |
| SCHEMBL30529835 | 0.89 | MAPT (0.49) | MAPTLMNAKDM4EALDH1A1KAT6A | |
| SCHEMBL6738877 | 0.89 | MAPT (0.49) | MAPTLMNAKDM4EALDH1A1KAT6A | |
| SCHEMBL7976575 | 0.84 | KDM4E (0.49) | MAPTLMNAKDM4EALDH1A1PLA2G7 | |
| SCHEMBL92016 | 0.84 | KDM4E (0.49) | MAPTLMNAKDM4EALDH1A1PLA2G7 | |
| SCHEMBL10673694 | 0.82 | KDM4E (0.42) | MAPTLMNAKDM4EALDH1A1PLA2G7 | |
| SCHEMBL10673690 | 0.82 | KDM4E (0.42) | MAPTLMNAKDM4EALDH1A1PLA2G7 | |
| SCHEMBL10083957 | 0.82 | MAPT (0.49) | MAPTLMNAKDM4EALDH1A1PLA2G7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120044752-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-116583784-A | Resist composition and resist pattern forming method | 东京应化工业株式会社 | 2023-08-11 | — | — | CN | disclosed |