SCHEMBL30529835

SCHEMBL30529835

COc1ccc(C(C#N)=NOS(=O)(=O)c2ccc3ccccc3c2)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 1/20 0.49
▸ LMNA P02545 3/20 0.49
▸ HTT P42858 2/20 0.49
▸ SMN1; SMN2 Q16637 2/20 0.49
▸ TDP1 Q9NUW8 1/20 0.49
▸ L3MBTL1 Q9Y468 1/20 0.49
▸ ALDH1A1 P00352 3/20 0.46
▸ KDM4E B2RXH2 2/20 0.46
▸ NPC1 O15118 3/20 0.43
▸ RAB9A P51151 3/20 0.43
▸ KAT6A Q92794 1/20 0.42
▸ KMT2A Q03164 2/20 0.41
▸ CASP3 P42574 2/20 0.41
▸ SENP7 Q9BQF6 2/20 0.41
▸ SENP8 Q96LD8 1/20 0.41
▸ SENP6 Q9GZR1 1/20 0.41
▸ TUBB4A P04350 1/20 0.41
▸ TUBB P07437 1/20 0.41
▸ TUBA3C P0DPH7 1/20 0.41
▸ TUBA1B P68363 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6738877 1.00 MAPT (0.49) MAPTLMNAHTTSMN1; SMN2TDP1
SCHEMBL5372313 1.00 MAPT (0.49) MAPTLMNAHTTSMN1; SMN2TDP1
SCHEMBL5369874 0.89 MAPT (0.54) MAPTLMNAL3MBTL1ALDH1A1KDM4E
SCHEMBL29761892 0.89 MAPT (0.54) MAPTLMNAL3MBTL1ALDH1A1KDM4E
SCHEMBL6743182 0.89 MAPT (0.54) MAPTLMNAL3MBTL1ALDH1A1KDM4E
SCHEMBL5918260 0.88 EP300 (0.45) MAPTTDP1ALDH1A1KDM4EF2
SCHEMBL5918261 0.88 EP300 (0.45) MAPTTDP1ALDH1A1KDM4EF2
SCHEMBL36510 0.87 HSD11B1 (0.46) MAPTLMNAHTTSMN1; SMN2L3MBTL1
SCHEMBL36511 0.87 HSD11B1 (0.46) MAPTLMNAHTTSMN1; SMN2L3MBTL1
SCHEMBL1470654 0.83 ALDH1A1 (0.49) MAPTLMNAHTTTDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120044752-A Photosensitive resin composition 东京应化工业株式会社 2025-05-27 — — CN disclosed
CN-116583784-A Resist composition and resist pattern forming method 东京应化工业株式会社 2023-08-11 — — CN disclosed
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