Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | KAT6A | Q92794 | 6/20 | 0.42 |
| ▸ | F2 | P00734 | 3/20 | 0.40 |
| ▸ | PRSS1 | P07477 | 3/20 | 0.40 |
| ▸ | PRSS2 | P07478 | 3/20 | 0.40 |
| ▸ | PRSS3 | P35030 | 3/20 | 0.40 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.38 |
| ▸ | CTSS | P25774 | 1/20 | 0.38 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5369874 | 1.00 | MAPT (0.54) | MAPTLMNAKDM4EALDH1A1KAT6A | |
| SCHEMBL29761892 | 1.00 | MAPT (0.54) | MAPTLMNAKDM4EALDH1A1KAT6A | |
| SCHEMBL5372313 | 0.89 | MAPT (0.49) | MAPTLMNAKDM4EALDH1A1KAT6A | |
| SCHEMBL30529835 | 0.89 | MAPT (0.49) | MAPTLMNAKDM4EALDH1A1KAT6A | |
| SCHEMBL6738877 | 0.89 | MAPT (0.49) | MAPTLMNAKDM4EALDH1A1KAT6A | |
| SCHEMBL7976575 | 0.84 | KDM4E (0.49) | MAPTLMNAKDM4EALDH1A1PLA2G7 | |
| SCHEMBL92016 | 0.84 | KDM4E (0.49) | MAPTLMNAKDM4EALDH1A1PLA2G7 | |
| SCHEMBL10673694 | 0.82 | KDM4E (0.42) | MAPTLMNAKDM4EALDH1A1PLA2G7 | |
| SCHEMBL10673690 | 0.82 | KDM4E (0.42) | MAPTLMNAKDM4EALDH1A1PLA2G7 | |
| SCHEMBL10083957 | 0.82 | MAPT (0.49) | MAPTLMNAKDM4EALDH1A1PLA2G7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6245930-B1 | AN OXIMESULFONATE COMPOUND CAPABLE OF GIVING POSITIVELY OR NEGATIVELY PATTERNED RESIST LAYER OF EXCELLENT PATTERN RESOLUTION, CROSS SECTIOANL PROFILE, AND HIGH SENSITIVITY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-06-12 | — | — | US | claimed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | claimed |
| US-6835530-B2 | Base material for lithography | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-12-28 | — | — | US | disclosed |
| US-20040121260-A1 | Base material for lithography | TOKYO OHKA KOGYO CO., LTD. | 2004-06-24 | — | — | US | disclosed |
| US-6689535-B2 | A NOVALAK RESIN CROSSLINKING AGENT HAVING HYDROXYALKYL AND/OR ALKOXYALKYL GROUPS AND AN ACIDIC COMPOUND; UNDERCOATINGS; A RECTANGULAR CROSS-SECTIONAL PROFILE WITHOUT CAUSING FOOTING, UNDERCUTTING, ETC. AT THE BOTTOM | TOKYO OHKA KOGYO CO., LTD (JP) | 2004-02-10 | — | — | US | disclosed |
| US-20020055064-A1 | Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-05-09 | — | — | US | disclosed |
| EP-0848289-B1 | Negative-working chemical sensitization photoresist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2002-02-27 | — | — | EP | disclosed |
| EP-0821274-B1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2001-11-14 | — | — | EP | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |
| US-6245930-B1 | AN OXIMESULFONATE COMPOUND CAPABLE OF GIVING POSITIVELY OR NEGATIVELY PATTERNED RESIST LAYER OF EXCELLENT PATTERN RESOLUTION, CROSS SECTIOANL PROFILE, AND HIGH SENSITIVITY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-06-12 | — | — | US | disclosed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | disclosed |
| US-5928837-A | Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-27 | — | — | US | disclosed |
| US-5817444-A | POLYHYDROXYSTYRENE SUBSTITUTED WITH TETRAHYDROPYRAN GROUPS, POLYHYDROXYSTYRENE SUBSTITUTED WITH ALKOXYALKYL GROUPS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-10-06 | — | — | US | disclosed |
| EP-0848289-A1 | Negative-working chemical sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-06-17 | — | — | EP | disclosed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | disclosed |