SCHEMBL29789940

SCHEMBL29789940

NC(N)(C(=O)OCc1c([N+](=O)[O-])cccc1[N+](=O)[O-])c1ccccc1C(=O)OCc1c([N+](=O)[O-])cccc1[N+](=O)[O-]

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ POLB P06746 2/20 0.46
▸ MEN1 O00255 1/20 0.46
▸ KMT2A Q03164 1/20 0.46
▸ RAB9A P51151 4/20 0.42
▸ CTSD P07339 1/20 0.41
▸ LMNA P02545 3/20 0.40
▸ MAPT P10636 2/20 0.40
▸ HTT P42858 2/20 0.40
▸ NPSR1 Q6W5P4 1/20 0.40
▸ ALDH1A1 P00352 7/20 0.40
▸ GAA P10253 2/20 0.40
▸ AR P10275 1/20 0.39
▸ SMN1; SMN2 Q16637 3/20 0.38
▸ MAPK1 P28482 1/20 0.38
▸ NPC1 O15118 3/20 0.37
▸ L3MBTL1 Q9Y468 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1055115 1.00 POLB (0.46) POLBMEN1KMT2ARAB9ACTSD
SCHEMBL29790083 0.88 MEN1 (0.46) POLBMEN1KMT2ARAB9ACTSD
SCHEMBL1058199 0.88 MEN1 (0.46) POLBMEN1KMT2ARAB9ACTSD
SCHEMBL1053060 0.81 MEN1 (0.43) POLBMEN1KMT2ARAB9ACTSD
SCHEMBL29790010 0.81 MEN1 (0.43) POLBMEN1KMT2ARAB9ACTSD
SCHEMBL1057096 0.80 RAB9A (0.64) POLBMEN1KMT2ARAB9ACTSD
SCHEMBL16924652 0.76 GPR35 (0.39) MEN1KMT2ACTSDLMNAMAPT
SCHEMBL16343391 0.74 MEN1 (0.46) POLBMEN1KMT2ARAB9ACTSD
SCHEMBL7603661 0.74 GPR35 (0.42) MEN1KMT2ACTSDHTTNPSR1
SCHEMBL8751735 0.74 GPR35 (0.42) MEN1KMT2ARAB9ACTSDLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107561863-B Positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2022-09-16 — — CN disclosed
CN-108732831-B Resin composition, substrate and element comprising same, and method for producing same JSR株式会社 2022-08-16 — — CN disclosed
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