SCHEMBL29790010

SCHEMBL29790010

NC(N)(c1ccccc1)c1cccc(C(=O)OCc2c([N+](=O)[O-])cccc2[N+](=O)[O-])c1C(=O)OCc1c([N+](=O)[O-])cccc1[N+](=O)[O-]

nearest known ligand 0.43

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 1/20 0.43
▸ POLB P06746 1/20 0.43
▸ KMT2A Q03164 1/20 0.43
▸ MAPT P10636 3/20 0.41
▸ LMNA P02545 2/20 0.41
▸ HTT P42858 1/20 0.41
▸ RAB9A P51151 4/20 0.40
▸ CTSD P07339 1/20 0.39
▸ ALDH1A1 P00352 7/20 0.38
▸ GAA P10253 2/20 0.38
▸ MAPK1 P28482 1/20 0.38
▸ NPC1 O15118 3/20 0.38
▸ L3MBTL1 Q9Y468 1/20 0.37
▸ SMN1; SMN2 Q16637 2/20 0.37
▸ TSHR P16473 1/20 0.36
▸ NPSR1 Q6W5P4 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1053060 1.00 MEN1 (0.43) MEN1POLBKMT2AMAPTLMNA
SCHEMBL1056774 0.90 MEN1 (0.43) MEN1POLBKMT2AMAPTLMNA
SCHEMBL29547816 0.90 MEN1 (0.43) MEN1POLBKMT2AMAPTLMNA
SCHEMBL29789940 0.81 POLB (0.46) MEN1POLBKMT2AMAPTLMNA
SCHEMBL1055115 0.81 POLB (0.46) MEN1POLBKMT2AMAPTLMNA
SCHEMBL16343391 0.81 MEN1 (0.46) MEN1POLBKMT2AMAPTLMNA
SCHEMBL1057096 0.77 RAB9A (0.64) MEN1POLBKMT2AMAPTLMNA
SCHEMBL16924662 0.75 RAB9A (0.46) MEN1POLBKMT2AMAPTLMNA
SCHEMBL19451176 0.74 ALDH1A1 (0.55) MEN1POLBKMT2AMAPTLMNA
SCHEMBL13758582 0.71 KMT2A (0.43) MEN1KMT2AMAPTLMNAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107561863-B Positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2022-09-16 — — CN disclosed
CN-108732831-B Resin composition, substrate and element comprising same, and method for producing same JSR株式会社 2022-08-16 — — CN disclosed
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