SCHEMBL29790083

SCHEMBL29790083

NC(N)(C(=O)OCc1ccccc1[N+](=O)[O-])c1ccccc1C(=O)OCc1ccccc1[N+](=O)[O-]

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 2/20 0.46
▸ KMT2A Q03164 2/20 0.46
▸ POLB P06746 1/20 0.46
▸ MAOB P27338 1/20 0.44
▸ RAB9A P51151 3/20 0.42
▸ ALDH1A1 P00352 6/20 0.41
▸ TSHR P16473 1/20 0.41
▸ CTSD P07339 1/20 0.41
▸ HTT P42858 2/20 0.40
▸ MAPT P10636 2/20 0.40
▸ LMNA P02545 2/20 0.40
▸ NPSR1 Q6W5P4 1/20 0.40
▸ GAA P10253 1/20 0.40
▸ AR P10275 1/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.39
▸ NPC1 O15118 2/20 0.38
▸ RECQL P46063 1/20 0.38
▸ KDM4E B2RXH2 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1058199 1.00 MEN1 (0.46) MEN1KMT2APOLBMAOBRAB9A
SCHEMBL1055115 0.88 POLB (0.46) MEN1KMT2APOLBRAB9AALDH1A1
SCHEMBL29789940 0.88 POLB (0.46) MEN1KMT2APOLBRAB9AALDH1A1
SCHEMBL16343391 0.86 MEN1 (0.46) MEN1KMT2APOLBMAOBRAB9A
SCHEMBL1058873 0.80 RAB9A (0.64) MEN1KMT2APOLBMAOBRAB9A
SCHEMBL1056774 0.80 MEN1 (0.43) MEN1KMT2APOLBMAOBRAB9A
SCHEMBL29547816 0.80 MEN1 (0.43) MEN1KMT2APOLBMAOBRAB9A
SCHEMBL31346758 0.78 ALDH1A1 (0.56) MEN1KMT2APOLBMAOBRAB9A
SCHEMBL13685790 0.78 MEN1 (0.58) MEN1KMT2APOLBMAOBRAB9A
SCHEMBL8673819 0.77 ALDH1A1 (0.47) MEN1KMT2APOLBMAOBRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107561863-B Positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2022-09-16 — — CN disclosed
CN-108732831-B Resin composition, substrate and element comprising same, and method for producing same JSR株式会社 2022-08-16 — — CN disclosed
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