Potassium Ion

Potassium Ion

SCHEMBL2987019

O=C([O-])OC(=O)[O-].[K+].[NH4+].[Zr].[Zr]

nearest known ligand 0.40

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Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
CA4 P22748 3/20 0.40
FAHD1 Q6P587 1/20 0.40
MEN1 O00255 1/20 0.33
LDHA P00338 1/20 0.33
BLM P54132 1/20 0.33
KMT2A Q03164 1/20 0.33
CA1 P00915 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Potassium Ion SCHEMBL1124622 0.92
Potassium Ion SCHEMBL28249158 0.88
Ethylene SCHEMBL31460785 0.85 CA4 (0.40) CA4FAHD1MEN1LDHABLM
SCHEMBL2214402 0.84
SCHEMBL10459297 0.84
SCHEMBL4359131 0.84 CA4 (0.36) CA4FAHD1CA1
SCHEMBL6294539 0.84 CA4 (0.36) CA4FAHD1CA1
SCHEMBL6541926 0.84 CA4 (0.36) CA4FAHD1CA1
Zinc Ion SCHEMBL6294528 0.84
SCHEMBL1706124 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100173104-A1 MANUFACTURING METHOD OF RECORDING MEDIUM, INKJET RECORDING MEDIUM, AND METHOD OF MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2010-07-08 US disclosed
EP-2004416-B1 INKJET RECORDING MEDIUM, AND METHOD OF MANUFACTURING THE SAME FUJIFILM CORP (JP) 2010-05-05 EP disclosed
EP-2004416-A4 MANUFACTURING METHOD OF RECORDING MEDIUM, INKJET RECORDING MEDIUM, AND METHOD OF MANUFACTURING THE SAME FUJIFILM CORP (JP) 2009-08-05 EP disclosed
EP-2004416-A1 MANUFACTURING METHOD OF RECORDING MEDIUM, INKJET RECORDING MEDIUM, AND METHOD OF MANUFACTURING THE SAME FUJIFILM Corporation (JP) 2008-12-24 EP disclosed
WO-2007116776-A1 MANUFACTURING METHOD OF RECORDING MEDIUM, INKJET RECORDING MEDIUM, AND METHOD OF MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2007-10-18 WO disclosed