SCHEMBL29920

SCHEMBL29920

OCCCC(O)C(O)CO

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
TDP1 Q9NUW8 2/20 0.40
THRB P10828 1/20 0.38
CYP2D6 P10635 2/20 0.34
SPHK1 Q9NYA1 1/20 0.34
GMNN O75496 1/20 0.34
POLB P06746 1/20 0.34
THPO P40225 1/20 0.34
MTOR P42345 1/20 0.34
BLM P54132 1/20 0.34
KDM4E B2RXH2 1/20 0.34
TP53 P04637 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP3A4 P08684 1/20 0.34
MAPT P10636 1/20 0.34
CETP P11597 1/20 0.34
HTT P42858 1/20 0.34
UBE2N P61088 1/20 0.34
PTPN1 P18031 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8750054 1.00 LMNA (0.42) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL12684655 1.00 LMNA (0.42) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL6692816 1.00 LMNA (0.42) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL21885889 1.00 LMNA (0.42) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL151903 0.91 LMNA (0.40) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL1687120 0.90 THRB (0.37) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL891846 0.88 LMNA (0.41) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL6448213 0.88 LMNA (0.41) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL2985499 0.88 LMNA (0.41) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL3168782 0.88 LMNA (0.41) LMNAL3MBTL1TDP1THRBCYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3845 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3527624-B1 POLYOXYMETHYLENE RESIN COMPOSITION KOREA ENG PLASTICS CO LTD (KR) 2025-11-26 EP claimed
EP-4621488-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME Ycchem Co., Ltd. (KR) 2025-09-24 EP claimed
US-20250236813-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME YCCHEM CO., LTD. (KR) 2025-07-24 US claimed
CN-120019333-A Flushing liquid composition for extreme ultraviolet lithography and pattern forming method using same YC化学制品株式会社 2025-05-16 CN claimed
WO-2025064521-A1 ULTRAFILTRATION / DIAFILTRATION PURIFICATION METHODS PROFOUNDBIO US CO. (US) 2025-03-27 WO claimed
WO-2024106711-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME 와이씨켐 주식회사 2024-05-23 WO claimed
US-11866577-B2 Additive manufacturing compositions and methods Polynt Composites USA, Inc. (US) 2024-01-09 US claimed
US-20230266672-A1 PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME YOUNG CHANG CHEMICAL CO., LTD (KR) 2023-08-24 US claimed
EP-4212958-A1 PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME Young Chang Chemical Co., Ltd. (KR) 2023-07-19 EP claimed
CN-108571582-B Method for lubricating surfaces 英菲诺姆国际有限公司 2023-07-04 CN claimed
US-5429898-A For color and black and white coping, controlling heat of fixing FUJI XEROX CO., LTD. (JP) 1995-07-04 US claimed
US-5234787-A Linear and nonlinear polyester binder resins and colorant KAO CORPORATION (JP) 1993-08-10 US claimed
EP-0464829-A1 Developer composition for electrophotography Kao Corporation (JP) 1992-01-08 EP claimed
EP-0164257-B1 TONER FOR DEVELOPING ELECTROSTATIC LATENT IMAGE KONICA CORPORATION (JP) 1991-04-17 EP claimed
US-4933252-A Toners KAO CORPORATION (JP) 1990-06-12 US claimed
US-4917983-A Toner for developing an electrostatic latent image comprising linear polyester polymer KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1990-04-17 US claimed
US-4877704-A WITH ALKYLENE-BIS-ALIPHATIC ACID AMIDE AND WAX; LOW TEMPERATURE FIXABILITY, STABILITY KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1989-10-31 US claimed
US-4804622-A POLYESTER BINDER KAO CORPORATION (JP) 1989-02-14 US claimed
US-4693952-A POLYESTER, EPOXY RESIN KONISHIROKU PHOTO INDUSTRY CO., LTD. 1987-09-15 US claimed
US-4579802-A APPLYING AN AGENT FOR IMPROVING ELASTICITY TO PREVENT BACK CONTAMINATION KONISHIROKU PHOTO INDUSTRY CO. LTD. (JP) 1986-04-01 US claimed