Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX5 | P09917 | 3/20 | 0.45 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.45 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 2/20 | 0.43 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.43 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | IDH1 | O75874 | 1/20 | 0.40 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | NQO1 | P15559 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | TUBB1 | Q9H4B7 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14478047 | 0.83 | CA1 (0.37) | PTGS1PTGS2MAPTGAAMEN1 | |
| SCHEMBL12922961 | 0.83 | CA1 (0.37) | PTGS1PTGS2MAPTGAAMEN1 | |
| SCHEMBL1417468 | 0.83 | ESR1 (0.39) | PTGS1PTGS2MAPTGAACYP3A4 | |
| SCHEMBL4056403 | 0.83 | MEN1 (0.39) | ALOX5PTGS1PTGS2MAPTGAA | |
| SCHEMBL30218223 | 0.83 | ESR1 (0.39) | PTGS1PTGS2MAPTGAACYP3A4 | |
| SCHEMBL12415057 | 0.81 | UGT2B7 (0.35) | PTGS1PTGS2NQO1CYP3A4CYP2D6 | |
| SCHEMBL30262493 | 0.81 | PTGS1 (0.49) | PTGS1PTGS2GAANQO1CYP3A4 | |
| SCHEMBL2992304 | 0.81 | PTGS1 (0.49) | PTGS1PTGS2GAANQO1CYP3A4 | |
| SCHEMBL2386958 | 0.80 | BCHE (0.49) | GAANQO1CYP3A4MEN1KMT2A | |
| SCHEMBL1176905 | 0.80 | GAA (0.40) | ALOX5PTGS1PTGS2MAPTGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4563610-A1 | RESIN COMPOSITION CONTAINING BIFUNCTIONAL PHENYLENE ETHER RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-06-04 | — | — | EP | disclosed |
| US-20250129243-A1 | RESIN COMPOSITION, AND CURABLE FILM AND LAMINATED PLATE CONTAINING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-04-24 | — | — | US | disclosed |
| WO-2023027060-A1 | RESIN COMPOSITION, AND CURABLE FILM AND LAMINATED PLATE CONTAINING SAME | 三菱瓦斯化学株式会社 | 2023-03-02 | — | — | WO | disclosed |
| US-7786219-B2 | Cyanate-terminated polyphenylene ether | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-08-31 | — | — | US | disclosed |
| US-20100048826-A1 | Polyphenylene ether oligomer compound, derivatives thereof and use thereof | ISHII KENJI | 2010-02-25 | — | — | US | disclosed |
| US-7632912-B2 | Carboxylic acid-modified bisphenol epoxy di(meth)acrylate | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2009-12-15 | — | — | US | disclosed |
| US-7595362-B2 | Curable resin composition | NIPPON STEEL CHEMICAL CO., LTD. (JP) | 2009-09-29 | — | — | US | disclosed |
| US-20090205856-A1 | Carboxylic Acid-Modified Bisphenol Epoxy Di(meth)acrylate | ISHII KENJI | 2009-08-20 | — | — | US | disclosed |
| US-7560518-B2 | (Meth)acrylated epoxy-terminated polyphenylene ether | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2009-07-14 | — | — | US | disclosed |
| US-7534547-B2 | Optically active compound and photosensitive resin composition | OSAKA GAS COMPANY LIMITED (JP) | 2009-05-19 | — | — | US | disclosed |
| US-20080269427-A1 | Polyphenylene ether oligomer compound, derivatives thereof and use thereof | ISHII KENJI | 2008-10-30 | — | — | US | disclosed |
| US-7393904-B2 | (Meth)acrylate-terminated polyphenylene ether | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-07-01 | — | — | US | disclosed |
| US-20080033117-A1 | Polyphenylene ether oligomer compound, derivatives thereof and use thereof | ISHII KENJI | 2008-02-07 | — | — | US | disclosed |
| US-7276563-B2 | Polyphenylene ether oligomer compound, derivatives thereof and use thereof | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-10-02 | — | — | US | disclosed |
| US-20070129502-A1 | Polyphenylene ethers; improved chemical resistance, dielectric, low water-absorption, heat resistance, flame retardance, and mechanical properties; laminates | NIPPON STEEL CHEMICAL CO., LTD. (JP) | 2007-06-07 | — | — | US | disclosed |
| US-20050065241-A1 | Polyphenylene ether oligomer compound, derivatives thereof and use thereof | ISHII KENJI (JP) | 2005-03-24 | — | — | US | disclosed |
| US-6835785-B2 | Curable end groups, such as allyl, (meth)acryloyloxy, glycidyloxy and cyanate groups; printed wiring board | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-12-28 | — | — | US | disclosed |
| EP-1375463-A1 | OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION | Kansai Research Institute, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | KRI, INC. (JP) | 2003-11-13 | — | — | US | disclosed |
| US-20030194562-A1 | Polyphenylene ether oligomer compound, derivatives thereof and use thereof | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-10-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090205856-A1 | Carboxylic Acid-Modified Bisphenol Epoxy Di(meth)acrylate | EED, MMAB, CAD | ALOX5 108/4885PTGS1 1496/4885PTGS2 1185/4885 |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | ARCN1, RAD51, PAM | ALOX5 576/4885PTGS1 369/4885PTGS2 1398/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.