SCHEMBL2992166

SCHEMBL2992166

COc1ccc(C(c2cc(C)c(O)c(C)c2C)c2cc(C)c(O)c(C)c2C)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 3/20 0.45
PTGS1 P23219 1/20 0.45
PTGS2 P35354 1/20 0.45
MAPT P10636 2/20 0.43
MCL1 Q07820 1/20 0.43
SLC2A1 P11166 1/20 0.41
GAA P10253 2/20 0.41
KDM4E B2RXH2 1/20 0.41
IDH1 O75874 1/20 0.40
PKM P14618 1/20 0.38
NQO1 P15559 1/20 0.38
CYP3A4 P08684 2/20 0.38
CYP1A2 P05177 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C9 P11712 1/20 0.38
ALOX15 P16050 1/20 0.38
CYP2C19 P33261 1/20 0.38
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
TUBB1 Q9H4B7 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14478047 0.83 CA1 (0.37) PTGS1PTGS2MAPTGAAMEN1
SCHEMBL12922961 0.83 CA1 (0.37) PTGS1PTGS2MAPTGAAMEN1
SCHEMBL1417468 0.83 ESR1 (0.39) PTGS1PTGS2MAPTGAACYP3A4
SCHEMBL4056403 0.83 MEN1 (0.39) ALOX5PTGS1PTGS2MAPTGAA
SCHEMBL30218223 0.83 ESR1 (0.39) PTGS1PTGS2MAPTGAACYP3A4
SCHEMBL12415057 0.81 UGT2B7 (0.35) PTGS1PTGS2NQO1CYP3A4CYP2D6
SCHEMBL30262493 0.81 PTGS1 (0.49) PTGS1PTGS2GAANQO1CYP3A4
SCHEMBL2992304 0.81 PTGS1 (0.49) PTGS1PTGS2GAANQO1CYP3A4
SCHEMBL2386958 0.80 BCHE (0.49) GAANQO1CYP3A4MEN1KMT2A
SCHEMBL1176905 0.80 GAA (0.40) ALOX5PTGS1PTGS2MAPTGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4563610-A1 RESIN COMPOSITION CONTAINING BIFUNCTIONAL PHENYLENE ETHER RESIN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-06-04 EP disclosed
US-20250129243-A1 RESIN COMPOSITION, AND CURABLE FILM AND LAMINATED PLATE CONTAINING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-04-24 US disclosed
WO-2023027060-A1 RESIN COMPOSITION, AND CURABLE FILM AND LAMINATED PLATE CONTAINING SAME 三菱瓦斯化学株式会社 2023-03-02 WO disclosed
US-7786219-B2 Cyanate-terminated polyphenylene ether MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-08-31 US disclosed
US-20100048826-A1 Polyphenylene ether oligomer compound, derivatives thereof and use thereof ISHII KENJI 2010-02-25 US disclosed
US-7632912-B2 Carboxylic acid-modified bisphenol epoxy di(meth)acrylate MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2009-12-15 US disclosed
US-7595362-B2 Curable resin composition NIPPON STEEL CHEMICAL CO., LTD. (JP) 2009-09-29 US disclosed
US-20090205856-A1 Carboxylic Acid-Modified Bisphenol Epoxy Di(meth)acrylate ISHII KENJI 2009-08-20 US disclosed
US-7560518-B2 (Meth)acrylated epoxy-terminated polyphenylene ether MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2009-07-14 US disclosed
US-7534547-B2 Optically active compound and photosensitive resin composition OSAKA GAS COMPANY LIMITED (JP) 2009-05-19 US disclosed
US-20080269427-A1 Polyphenylene ether oligomer compound, derivatives thereof and use thereof ISHII KENJI 2008-10-30 US disclosed
US-7393904-B2 (Meth)acrylate-terminated polyphenylene ether MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-07-01 US disclosed
US-20080033117-A1 Polyphenylene ether oligomer compound, derivatives thereof and use thereof ISHII KENJI 2008-02-07 US disclosed
US-7276563-B2 Polyphenylene ether oligomer compound, derivatives thereof and use thereof MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-10-02 US disclosed
US-20070129502-A1 Polyphenylene ethers; improved chemical resistance, dielectric, low water-absorption, heat resistance, flame retardance, and mechanical properties; laminates NIPPON STEEL CHEMICAL CO., LTD. (JP) 2007-06-07 US disclosed
US-20050065241-A1 Polyphenylene ether oligomer compound, derivatives thereof and use thereof ISHII KENJI (JP) 2005-03-24 US disclosed
US-6835785-B2 Curable end groups, such as allyl, (meth)acryloyloxy, glycidyloxy and cyanate groups; printed wiring board MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-12-28 US disclosed
EP-1375463-A1 OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Kansai Research Institute, Inc. (JP) 2004-01-02 EP disclosed
US-20030211421-A1 Optically active compound and photosensitive resin composition KRI, INC. (JP) 2003-11-13 US disclosed
US-20030194562-A1 Polyphenylene ether oligomer compound, derivatives thereof and use thereof MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-10-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090205856-A1 Carboxylic Acid-Modified Bisphenol Epoxy Di(meth)acrylate EED, MMAB, CAD ALOX5 108/4885PTGS1 1496/4885PTGS2 1185/4885
US-20030211421-A1 Optically active compound and photosensitive resin composition ARCN1, RAD51, PAM ALOX5 576/4885PTGS1 369/4885PTGS2 1398/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.