Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DRD2 | P14416 | 11/20 | 0.49 |
| ▸ | DRD3 | P35462 | 10/20 | 0.49 |
| ▸ | DRD4 | P21917 | 9/20 | 0.49 |
| ▸ | DRD1 | P21728 | 7/20 | 0.49 |
| ▸ | DRD5 | P21918 | 7/20 | 0.49 |
| ▸ | HTR5A | P47898 | 1/20 | 0.42 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.41 |
| ▸ | HTR1D | P28221 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23467151 | 0.99 | DRD2 (0.50) | DRD2DRD3DRD4DRD1DRD5 | |
| SCHEMBL9956909 | 0.86 | DRD2 (0.62) | DRD2DRD3DRD4DRD1DRD5 | |
| SCHEMBL4096013 | 0.84 | DRD2 (0.64) | DRD2DRD3DRD4DRD1DRD5 | |
| SCHEMBL31614215 | 0.81 | DRD2 (0.46) | DRD2DRD3DRD4DRD1DRD5 | |
| Iodide SCHEMBL8734869 | 0.80 | DRD2 (0.51) | DRD2DRD3DRD4DRD1DRD5 | |
| SCHEMBL22444937 | 0.78 | DRD2 (0.60) | DRD2DRD3DRD4DRD1DRD5 | |
| SCHEMBL30677113 | 0.77 | HTR1A (0.46) | DRD2DRD3DRD4DRD1DRD5 | |
| SCHEMBL25496406 | 0.76 | DRD2 (0.47) | DRD2DRD3DRD4DRD1DRD5 | |
| SCHEMBL15586261 | 0.76 | DRD2 (0.43) | DRD2DRD3DRD4DRD1DRD5 | |
| Hydrogen Sulfide SCHEMBL22631538 | 0.75 | HTR6 (0.60) | DRD2DRD3DRD4DRD1DRD5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023068177-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | 信越化学工業株式会社 | 2023-04-27 | — | — | WO | disclosed |
| WO-2023017666-A1 | SILPHENYLENE-SKELETON-CONTAINING POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING OPTICAL SEMICONDUCTOR DEVICE | 信越化学工業株式会社 | 2023-02-16 | — | — | WO | disclosed |
| WO-2023276578-A1 | LAYERED BODY, METHOD FOR MANUFACTURING LAYERED BODY, AND METHOD FOR FORMING PATTERN | 信越化学工業株式会社 | 2023-01-05 | — | — | WO | disclosed |
| WO-2022215403-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | 信越化学工業株式会社 | 2022-10-13 | — | — | WO | disclosed |