SCHEMBL2995279

SCHEMBL2995279

Cc1cc(N)ccc1Oc1ccc(S(=O)(=O)c2ccc(Oc3ccc(N)cc3C)cc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR6 P50406 3/20 0.47
TSHR P16473 2/20 0.47
LMNA P02545 1/20 0.47
MPO P05164 1/20 0.47
CYP3A4 P08684 1/20 0.47
CYP2C9 P11712 1/20 0.47
HTT P42858 3/20 0.46
SMN1; SMN2 Q16637 3/20 0.46
L3MBTL1 Q9Y468 2/20 0.45
TDP1 Q9NUW8 1/20 0.45
PKM P14618 2/20 0.43
ALDH1A1 P00352 3/20 0.42
PTPN1 P18031 1/20 0.42
NR1I2 O75469 1/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
RAPGEF4 Q8WZA2 1/20 0.41
MAPT P10636 1/20 0.40
POLB P06746 1/20 0.40
MAPK1 P28482 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3315152 0.90 TSHR (0.47) HTR6TSHRLMNAMPOCYP3A4
SCHEMBL18723666 0.89 L3MBTL1 (0.49) SMN1; SMN2L3MBTL1ALDH1A1MEN1KMT2A
SCHEMBL2992329 0.86 ALDH1A1 (0.52) TSHRLMNACYP3A4CYP2C9SMN1; SMN2
SCHEMBL1155719 0.84 ALDH1A1 (0.55) TSHRCYP3A4SMN1; SMN2TDP1ALDH1A1
SCHEMBL29688467 0.84 ALDH1A1 (0.55) TSHRLMNACYP3A4SMN1; SMN2TDP1
SCHEMBL3003478 0.84 ALDH1A1 (0.55) TSHRLMNACYP3A4SMN1; SMN2TDP1
SCHEMBL31457276 0.84 ALDH1A1 (0.55) TSHRCYP3A4SMN1; SMN2TDP1ALDH1A1
SCHEMBL5554646 0.81 TEAD4 (0.61) TSHRLMNACYP3A4SMN1; SMN2TDP1
SCHEMBL2989217 0.81 ALDH1A1 (0.47) TSHRLMNACYP3A4CYP2C9SMN1; SMN2
SCHEMBL30026906 0.81 TEAD4 (0.61) TSHRLMNACYP3A4SMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11885694-B2 Temperature sensor element SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-01-30 US disclosed
US-11674920-B2 Moisture-sensitive film and sensor using same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
CN-111133032-B Polyimide, polyimide varnish, and polyimide film 三菱瓦斯化学株式会社 2022-07-19 CN disclosed
CN-111051384-B Polyimide, polyimide varnish, and polyimide film 三菱瓦斯化学株式会社 2022-06-28 CN disclosed
US-20220082452-A1 TEMPERATURE SENSOR ELEMENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-03-17 US disclosed
US-20220065708-A1 TEMPERATURE SENSOR ELEMENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-03-03 US disclosed
US-20220065707-A1 TEMPERATURE SENSOR ELEMENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-03-03 US disclosed
US-11261303-B2 Polyimide resin film and method for producing polyimide resin film MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-03-01 US disclosed
US-20210381905-A1 TEMPERATURE SENSOR ELEMENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-09 US disclosed
US-20210364368-A1 TEMPERATURE SENSOR ELEMENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-11-25 US disclosed
CN-111051384-A Polyimide, polyimide varnish, and polyimide film 三菱瓦斯化学株式会社 2020-04-21 CN disclosed
WO-2019188770-A1 MOISTURE-SENSITIVE FILM AND SENSOR USING SAME 住友化学株式会社 2019-10-03 WO disclosed
US-20190185631-A1 POLYIMIDE RESIN FILM AND METHOD FOR PRODUCING POLYIMIDE RESIN FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-06-20 US disclosed
EP-3489284-A1 POLYIMIDE RESIN FILM AND METHOD FOR PRODUCING POLYIMIDE RESIN FILM Mitsubishi Gas Chemical Company, Inc. (JP) 2019-05-29 EP disclosed
US-9193850-B2 Nanocomposite, process for preparing the same, and surface emitting device SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-11-24 US disclosed
US-20130037786-A1 NANOCOMPOSITE, PROCESS FOR PREPARING THE SAME, AND SURFACE EMITTING DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-02-14 US disclosed
US-8357322-B2 Process and apparatus for production of colorless transparent resin film MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-01-22 US disclosed
EP-2147766-B1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM MITSUBISHI GAS CHEMICAL CO (JP) 2012-08-01 EP disclosed
US-20100187719-A1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-07-29 US disclosed
EP-2147766-A1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM Mitsubishi Gas Chemical Company, Inc. (JP) 2010-01-27 EP disclosed