SCHEMBL29967490

SCHEMBL29967490

Oc1c(Cl)cc(C2(c3cc(Cl)c(O)c(Cl)c3)c3ccccc3-c3ccccc32)cc1Cl

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.50
ESR2 Q92731 1/20 0.50
DHFR P00374 2/20 0.47
TYMS P04818 2/20 0.47
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
KDM4E B2RXH2 1/20 0.46
LMNA P02545 1/20 0.46
MAPT P10636 1/20 0.46
OPRK1 P41145 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
PDK2 Q15119 8/20 0.39
TTR P02766 1/20 0.38
ALDH1A1 P00352 1/20 0.38
CYP3A4 P08684 1/20 0.38
TSHR P16473 1/20 0.38
RECQL P46063 1/20 0.38
HSD17B10 Q99714 1/20 0.38
STK10 O94804 1/20 0.38
GSK3A P49840 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2837959 1.00 ESR1 (0.50) ESR1ESR2DHFRTYMSMEN1
SCHEMBL10696792 0.90 ESR2 (0.58) ESR1ESR2DHFRTYMSMEN1
SCHEMBL8065196 0.90 AKR1C1 (0.49) ESR1ESR2DHFRTYMSMEN1
SCHEMBL2837044 0.81 ESR2 (0.65) ESR1ESR2DHFRTYMSMEN1
SCHEMBL29850833 0.81 ESR2 (0.65) ESR1ESR2DHFRTYMSMEN1
SCHEMBL9156287 0.81 MAPT (0.55) ESR1ESR2MEN1KMT2AKDM4E
SCHEMBL13072629 0.81 DHFR (0.38) ESR1ESR2DHFRTYMSMEN1
SCHEMBL29616926 0.80 ESR1 (0.58) ESR1ESR2MEN1KMT2AKDM4E
SCHEMBL5448639 0.80 ESR1 (0.58) ESR1ESR2MEN1KMT2AKDM4E
SCHEMBL9751282 0.78 PDK2 (0.47) ESR1ESR2MEN1KMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122072433-A Photosensitive resin composition for black resist, method for producing resin composition, light-shielding film, optical filter, touch panel, and display device 日铁化学材料株式会社 2026-05-22 CN disclosed
CN-113050372-B Photosensitive resin composition for black resist, light shielding film, color filter, touch panel, and display device 日铁化学材料株式会社 2026-05-12 CN disclosed
CN-112162462-B Photosensitive resin composition for touch screen, cured film thereof, and touch screen having cured film thereof 日铁化学材料株式会社 2025-04-08 CN disclosed
CN-110515268-B Photosensitive resin composition, cured product of the same, and display device containing the cured product 日铁化学材料株式会社 2024-12-06 CN disclosed
CN-111103760-B Photosensitive resin composition for partition wall, cured product, and method for producing partition wall 日铁化学材料株式会社 2024-10-18 CN disclosed
CN-118732390-A Photosensitive resin composition, cured film, substrate with cured film, and method for producing substrate with cured film 日铁化学材料株式会社 2024-10-01 CN disclosed
CN-118534725-A Photosensitive resin composition and method for producing substrate with resin film 日铁化学材料株式会社 2024-08-23 CN disclosed
CN-109634056-B Photosensitive resin composition and method for producing substrate with resin film 日铁化学材料株式会社 2024-07-09 CN disclosed
CN-117991589-A Photosensitive resin composition for black resist, light shielding film, color filter, touch panel, and display device 日铁化学材料株式会社 2024-05-07 CN disclosed
CN-108693704-B Photosensitive resin composition, light shielding film, liquid crystal display device, and method for manufacturing light shielding film and liquid crystal display device 日铁化学材料株式会社 2024-03-26 CN disclosed
CN-111367143-B Black resin composition for light shielding film, substrate with light shielding film, color filter and touch screen 日铁化学材料株式会社 2023-10-31 CN disclosed
CN-116893573-A Photosensitive resin composition, cured film, substrate with cured film, and method for producing substrate with cured film 日铁化学材料株式会社 2023-10-17 CN disclosed
CN-116893574-A Substrate with cured film, photosensitive resin composition, method for producing substrate with cured film, and display device 日铁化学材料株式会社 2023-10-17 CN disclosed
CN-110888301-B Photosensitive resin composition for light-shielding film, light-shielding film formed by hardening same, and color filter 日铁化学材料株式会社 2023-08-15 CN disclosed
CN-116360215-A Photosensitive resin composition for black resist, process for producing the same, light shielding film, color filter, touch panel, and display device 日铁化学材料株式会社 2023-06-30 CN disclosed
CN-116360214-A Photosensitive resin composition, cured film, substrate with cured film, method for producing substrate with cured film, and display device 日铁化学材料株式会社 2023-06-30 CN disclosed
CN-116360209-A Photosensitive resin composition, cured film, substrate with cured film, method for producing substrate with cured film, and display device 日铁化学材料株式会社 2023-06-30 CN disclosed
CN-115903385-A Photosensitive resin composition, cured film, color filter, touch panel, and display device 日铁化学材料株式会社 2023-04-04 CN disclosed
CN-115145118-A Photosensitive resin composition for black resist, light-shielding film, and method for producing light-shielding film for color filter 日铁化学材料株式会社 2022-10-04 CN disclosed
CN-115113481-A Photosensitive resin, photosensitive resin composition, cured product, and color filter 日铁化学材料株式会社 2022-09-27 CN disclosed