SCHEMBL2997554

SCHEMBL2997554

Cc1cc(N)ccc1Oc1cccc(Oc2ccc(N)cc2C)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.53
MAPT P10636 4/20 0.53
MEN1 O00255 3/20 0.53
KMT2A Q03164 3/20 0.53
SMN1; SMN2 Q16637 2/20 0.53
GAA P10253 2/20 0.53
MITF O75030 1/20 0.53
GFER P55789 1/20 0.53
NLRP1 Q9C000 1/20 0.53
NOD2 Q9HC29 1/20 0.53
MAOB P27338 1/20 0.47
L3MBTL1 Q9Y468 2/20 0.46
CYP3A4 P08684 2/20 0.44
NPSR1 Q6W5P4 1/20 0.43
KDM4E B2RXH2 3/20 0.42
BRCA1 P38398 1/20 0.42
HBB P68871 1/20 0.42
HSD17B10 Q99714 1/20 0.42
POLB P06746 2/20 0.42
HSP90AA1 P07900 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7569937 0.94 MAOB (0.55) ALDH1A1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL5549549 0.93 SMN1; SMN2 (0.62) ALDH1A1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL5549472 0.91 ALDH1A1 (0.64) ALDH1A1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL29764012 0.90 ALDH1A1 (0.50) ALDH1A1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL23850 0.90 ALDH1A1 (0.50) ALDH1A1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL7879764 0.89 SMN1; SMN2 (0.66) ALDH1A1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL2992849 0.89 MAOA (0.52) ALDH1A1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL3359198 0.88 L3MBTL1 (0.55) ALDH1A1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL22966228 0.88 ALDH1A1 (0.44) ALDH1A1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL30879420 0.88 ALDH1A1 (0.44) ALDH1A1MAPTMEN1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114479076-B Low-dielectric polyimide film and preparation method and application thereof 浙江中科玖源新材料有限公司 2023-09-19 CN claimed
CN-113968970-B Polyimide film with low thermal expansion coefficient and preparation method and application thereof 浙江中科玖源新材料有限公司 2023-07-07 CN claimed
US-11885694-B2 Temperature sensor element SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-01-30 US disclosed
CN-114479074-B High-temperature-resistant transparent polyimide film and preparation method and application thereof 浙江中科玖源新材料有限公司 2023-12-19 CN disclosed
CN-113943419-B High-temperature-resistant low-CTE polyimide film and preparation method and application thereof 浙江中科玖源新材料有限公司 2023-11-07 CN disclosed
CN-114479076-B Low-dielectric polyimide film and preparation method and application thereof 浙江中科玖源新材料有限公司 2023-09-19 CN disclosed
CN-113968970-B Polyimide film with low thermal expansion coefficient and preparation method and application thereof 浙江中科玖源新材料有限公司 2023-07-07 CN disclosed
US-11674920-B2 Moisture-sensitive film and sensor using same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
CN-111133032-B Polyimide, polyimide varnish, and polyimide film 三菱瓦斯化学株式会社 2022-07-19 CN disclosed
CN-111051384-B Polyimide, polyimide varnish, and polyimide film 三菱瓦斯化学株式会社 2022-06-28 CN disclosed
CN-114479074-A High-temperature-resistant transparent polyimide film and preparation method and application thereof 浙江中科玖源新材料有限公司 2022-05-13 CN disclosed
WO-2020162418-A1 COLORLESS TRANSPARENT POLYIMIDE FILM 三菱瓦斯化学株式会社 2020-08-13 WO disclosed
US-20190185631-A1 POLYIMIDE RESIN FILM AND METHOD FOR PRODUCING POLYIMIDE RESIN FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-06-20 US disclosed
EP-3489284-A1 POLYIMIDE RESIN FILM AND METHOD FOR PRODUCING POLYIMIDE RESIN FILM Mitsubishi Gas Chemical Company, Inc. (JP) 2019-05-29 EP disclosed
US-9193850-B2 Nanocomposite, process for preparing the same, and surface emitting device SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-11-24 US disclosed
US-20130037786-A1 NANOCOMPOSITE, PROCESS FOR PREPARING THE SAME, AND SURFACE EMITTING DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-02-14 US disclosed
US-8357322-B2 Process and apparatus for production of colorless transparent resin film MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-01-22 US disclosed
EP-2147766-B1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM MITSUBISHI GAS CHEMICAL CO (JP) 2012-08-01 EP disclosed
US-20100187719-A1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-07-29 US disclosed
EP-2147766-A1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM Mitsubishi Gas Chemical Company, Inc. (JP) 2010-01-27 EP disclosed