SCHEMBL30002011

SCHEMBL30002011

ClCc1cccc2[nH]nnc12

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1426960 1.00
SCHEMBL26980545 0.85
SCHEMBL29696957 0.84 GPR84 (0.32)
SCHEMBL449004 0.84 GPR84 (0.32)
SCHEMBL9186966 0.84
SCHEMBL30829735 0.82 PARP1 (0.36)
SCHEMBL656754 0.82 PARP1 (0.36)
SCHEMBL28852118 0.82
SCHEMBL3107123 0.81
SCHEMBL284553 0.81 GABRA1 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118833939-A Low-phosphorus sulfur-free corrosion and scale inhibitor for boiler and preparation method thereof 河北德福佳昌化工有限公司 2024-10-25 CN claimed
CN-118833939-A Low-phosphorus sulfur-free corrosion and scale inhibitor for boiler and preparation method thereof 河北德福佳昌化工有限公司 2024-10-25 CN disclosed
CN-115232144-B Nitrogen-containing condensed ring derivative, pharmaceutical composition, and preparation method and application thereof 长春金赛药业有限责任公司 2024-04-02 CN disclosed
US-11505718-B2 Barrier ruthenium chemical mechanical polishing slurry FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2022-11-22 US disclosed
CN-115232144-A Nitrogen-containing fused ring derivative, pharmaceutical composition, preparation method and application thereof 长春金赛药业有限责任公司 2022-10-25 CN disclosed