SCHEMBL656754

SCHEMBL656754

OCc1cccc2[nH]nnc12

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PARP1 P09874 1/20 0.36
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
KDM4E B2RXH2 2/20 0.34
LMNA P02545 2/20 0.34
TP53 P04637 1/20 0.34
MAPT P10636 1/20 0.34
TSHR P16473 1/20 0.34
ALOX12 P18054 1/20 0.34
CHRNE Q04844 1/20 0.34
APOBEC3G Q9HC16 1/20 0.33
PDCD1 Q15116 1/20 0.32
CD274 Q9NZQ7 1/20 0.32
CNR1 P21554 1/20 0.32
CNR2 P34972 1/20 0.32
MAP2K4 P45985 1/20 0.31
CCNT1 O60563 1/20 0.31
CCNE2 O96020 1/20 0.31
CCNE1 P24864 1/20 0.31
CDK2 P24941 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30829735 1.00 PARP1 (0.36) PARP1MEN1KMT2AKDM4ELMNA
SCHEMBL1866265 0.87 ALDH1A1 (0.31) TSHRALDH1A1HTT
SCHEMBL3906692 0.86 PARP1 (0.43) PARP1APOBEC3GPDCD1CD274CNR2
SCHEMBL449004 0.86 GPR84 (0.32) MEN1KMT2AMAPT
SCHEMBL9186966 0.86
SCHEMBL29696957 0.86 GPR84 (0.32) MEN1KMT2AMAPT
SCHEMBL11437604 0.84 KDM4E (0.35) KDM4EMAPTALDH1A1
SCHEMBL1426960 0.82
SCHEMBL284553 0.82 GABRA1 (0.39) MEN1KMT2AKDM4EMAPTALDH1A1
SCHEMBL730353 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 184 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115679321-B Metal etching solution 深圳新宙邦科技股份有限公司 2024-12-13 CN claimed
CN-118685774-A Cu-MTD etching solution for liquid crystal display panel and preparation method thereof 四川江化微电子材料有限公司 2024-09-24 CN claimed
CN-117779030-A Silicon crystal tank liquid and environment-friendly metal surface treatment process 开平和盟环保科技有限公司 2024-03-29 CN claimed
CN-116536666-A Etching solution composition and application thereof 深圳新宙邦科技股份有限公司 2023-08-04 CN claimed
CN-115679321-A Metal etching liquid 深圳新宙邦科技股份有限公司 2023-02-03 CN claimed
CN-114381734-B Etching solution composition for etching copper double-layer metal wiring structure, preparation method, application and method for manufacturing thin film array substrate 达高工业技术研究院(广州)有限公司 2022-09-27 CN claimed
CN-114438495-A Metal etching solution and metal etching method 宣城亨旺新材料有限公司 2022-05-06 CN claimed
CN-114381734-A Etching solution composition for etching copper double-layer metal wiring structure, preparation method, application and method for manufacturing thin film array substrate 达高工业技术研究院(广州)有限公司 2022-04-22 CN claimed
CN-107475715-B Hydrogen peroxide stabilizer and etching composition containing same 易案爱富科技有限公司 2022-04-08 CN claimed
CN-113667979-A Copper-molybdenum metal etching solution and application thereof TCL华星光电技术有限公司 2021-11-19 CN claimed
CN-108235710-B Etching liquid composition 易案爱富科技有限公司 2021-03-30 CN claimed
WO-2020062590-A1 COMPOSITION FOR CHEMICAL ETCHING OF COPPER-MOLYBDENUM ALLOY FILM 惠州市宙邦化工有限公司 2020-04-02 WO claimed
US-12565567-B2 Multifunctional smart particles SYNMATTER LLC (US) 2026-03-03 US disclosed
US-20240239968-A1 Multifunctional Smart Particles SYNMATTER LLC (US) 2024-07-18 US disclosed
CN-117779030-B Silicon crystal tank liquid and environment-friendly metal surface treatment process 开平和盟环保科技有限公司 2024-05-17 CN disclosed
CN-115232144-B Nitrogen-containing condensed ring derivative, pharmaceutical composition, and preparation method and application thereof 长春金赛药业有限责任公司 2024-04-02 CN disclosed
WO-1995004051-A1 PIPERAZINE COMPOUNDS USED IN THERAPY THE WELLCOME FOUNDATION LIMITED (GB) 1995-02-09 WO disclosed
CN-1018655-B Phosphorus-nitrogen type ash-free antiwear additive for lubricating oil UNIV SHANGHAI POLYTECH (CN) 1992-10-14 CN disclosed
US-5070113-A MINIMIZATION OF DEPLETION OF OZONE LAYER DAIKIN INDUSTRIES, LTD. (JP) 1991-12-03 US disclosed
EP-0401722-A1 Use of blowing compositions DAIKIN INDUSTRIES, LIMITED (JP) 1990-12-12 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12565567-B2 Multifunctional smart particles KCNN3, KCNN1, KCNN2 PARP1 4198/4885MEN1 2129/4885KMT2A 1030/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.